USPTO serial 76075632
Reviewed by CopyMark Law Group
Status 710 means the registration was cancelled because a required Section 8 declaration of continued use was not filed within the deadline (including any grace period). The federal registration is no longer active. Evaluate filing a new application if you still use the mark, or petition if cancellation was erroneous. Consult counsel on remaining common-law rights.
If you own this trademark, we can monitor new filings and help with USPTO deadlines. If you do not, we can file a new U.S. application.
72124 Pliezhausen, DE
72124 Pliezhausen, DE
72124 Pliezhausen, DE
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces | SECTION 8 - CANCELLED | — |
| 037 | Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces | SECTION 8 - CANCELLED | — |
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
| Date | Code | Event | What it means |
|---|---|---|---|
| Jun 20, 2009 | C8.. | CANCELLED SEC. 8 (6-YR) | — |
| Jan 8, 2008 | CFIT | CASE FILE IN TICRS | — |
| Jan 2, 2008 | ASCK | ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY | — |
| Nov 17, 2002 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Nov 12, 2002 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Aug 20, 2002 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Jul 31, 2002 | NPUB | NOTICE OF PUBLICATION | — |
| Mar 18, 2002 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Mar 14, 2002 | CNEA | EXAMINERS AMENDMENT MAILED | — |
| Mar 6, 2002 | CNEA | EXAMINERS AMENDMENT MAILED | — |
| Dec 18, 2001 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Dec 14, 2001 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Jun 14, 2001 | CNRT | NON-FINAL ACTION MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jun 12, 2001 | DOCK | ASSIGNED TO EXAMINER | — |
| Aug 29, 2000 | 44DD | SEC. 44(D) CLAIM DELETED | — |
| Aug 29, 2000 | AMPX | PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED | — |