Drawing for TRITON

USPTO serial 76218315

TRITON

Reviewed by CopyMark Law Group

Status 601
Filing date
Status date
Registration date
Examiner
PAPPAS, MATTHEW
Law office
FILE REPOSITORY (FRANCONIA)

What this means

This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.

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Owner

Goods and services

ClassDescriptionStatusFirst use
007Machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and solar cells; machines for drying, cleaning or etching silicon wafers for use in the in the manufacture of semiconductor chips; wet processing machines for use manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and machine parts, namely, drying units using nitrogen, alcohol vapors or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, and solar cellsACTIVE
011Drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfacesACTIVE
037Installation and servicing of the following machines and units, machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips, and/or solar cells, machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips wafers, liquid crystal displays, semiconductor wafers and solar cells as well as their surfacesACTIVE

Related trademarks

CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.

Prosecution history

DateCodeEventWhat it means
Jan 6, 2003ABN1ABANDONMENT - EXPRESS MAILED
Dec 13, 2002DOCKASSIGNED TO EXAMINER
Nov 21, 2002CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
Jul 8, 2002TCCATEAS CHANGE OF CORRESPONDENCE RECEIVED
Jul 3, 2002CNFRFINAL REFUSAL MAILEDA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Nov 21, 2001CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
May 22, 2001CNRTNON-FINAL ACTION MAILEDA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
May 7, 2001UNPRUNRESPONSIVE/DUPLICATE PAPER RECEIVED
May 7, 20011.BDSec. 1(B) CLAIM DELETED
May 7, 2001DOCKASSIGNED TO EXAMINER

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