Drawing for SINGULUS S

USPTO serial 79296654

SINGULUS S

Reviewed by CopyMark Law Group

Reg. 6661770Status 700Registered
Filing date
Status date
Registration date
Mar 8, 2022
Examiner
MASON, JARED MICHAEL
Law office
PUBLICATION AND ISSUE SECTION

What this means

Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six. Calendar Section 8 between years five and six, and consider trademark monitoring.

Status 700: Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six.

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Owner

Goods and services

ClassDescriptionStatusFirst use
007Machines for plasma surface treatment; machines for chemical surface treatment; machines for large area coating using sputter deposition, namely horizontal or vertical or tilted sputtering deposition and machines for vacuum deposition for coating of layers, in particular transparent, conductive, metallic, semi-conductive, non-conductive, dielectric ,transparent and electrically conductive or passivating layers, in particular using physical or chemical vapour deposition; machines, namely, physical or chemical vacuum deposition machines for coating planar and three-dimensional substrates and machines for multi-layer vacuum deposition for coating of metals and ceramics; machines for vacuum deposition for coating of layers, in particular transparent, conductive, metallic, semi-conductive, non-conductive, dielectric, transparent and electrically conductive or passivating layers, in particular using physical or chemical vapour deposition on substrates; machines for large area coating using vacuum deposition, namely horizontal or vertical or tilted sputtering deposition for vacuum deposition for coating of metal, metal alloys, metal oxides or metal nitrides; machines for the production of optical storage media and optical storage discs for high-definition and ultra-definition resolution content for vacuum deposition for coating of metals, metal alloys, metal oxides or metal nitrides; machines for vacuum deposition for coating of metals, metal alloys, phase transition ceramics or semiconductors; combinations of machines for automation of substrate handling and processing for the refinement of planar and three-dimensional substrates namely for vacuum deposition for coating of metals, metal alloys, metal oxides, or metal nitrides semiconductors; machines for cleaning glass or silicon substrates; in-line machines for cleaning thin-film solar cells; machines for cleaning of substrates, namely, semiconductor and glass wafers and machines for cleaning for single side and double side processing of glass and silicon substrates; machines for chemical cleaning of mono and multi crystalline silicon; machines for etching thin-film solar cells; machines for etching substrates, namely, semiconductor and glass wafers; in-line machines for acidic etching or alkaline etching, for single side and double side processing; machines for chemical etching of mono and multi crystalline silicon; machines for injection molding; machines for replication being manufacturing, namely manufacturing of optical discs including CD, DVD, HD-DVD and other types of optical discs and optical storage media; machines for lacquering; machines for embossing; machines for nano imprint lithography by wet embossing; machines for laser exposure changing a material from an amorphous structure into a crystalline structure; machines for photoresist developing in the nature of laser exposure or laser beam recording; machines for laser beam recording, namely, for the production of master disc for the replication of optical disc or optical storage media; machines for wet chemical treatment, namely, machines used for wet-chemical etching, cleaning, coating and drying of substrates; machines for wet chemical deposition; automated cargo handling apparatus, namely for transporting, conveying, lifting, handling, loading and packaging objects, parts, workpieces, and materials; moving and handling equipment, namely handling arms conveyors being cargo handling machines, conveyor belts and industrial robots; mechanisms for transportation, namely, pneumatic transporters; combinations of industrial machines and automated handling apparatus for performing several processes regarding treatment of materials, namely for automation of substrate handling and processing for the refinement of planar and three-dimensional substrates, namely for vacuum deposition for coating of layers, in particular transparent, conductive, metallic, semi-conductive, non-conductive, dielectric, transparent and electrically conductive or passivating layers, in particular using physical or chemical vapour deposition, for surface treatment of substrates, for lacquering, namely, spray-coating of substrates with UV curable lacquer or solvent based lacquer, for UV-curing or drying; combinations of machines for manufacturing silicon solar cells, namely for automation of substrate handling and processing, for vacuum deposition for coating of transparent, conductive, metallic, semi-conductive, non-conductive, dielectric, transparent and electrically conductive, or passivating layers, for wet chemical treatment of substrates, for laser ablation, namely, electrical insulating, for structuring, for contact opening, for contact firing of substrates and screen print and for thermal treatment of substrates; combinations of industrial machines and automated handling apparatus for performing several processes regarding treatment of materials, namely for manufacturing thin film solar cells, namely for automation of substrate handling and processing, for vacuum deposition for coating of substrates, for wet chemical treatment of substrates, for laser ablation, namely, surface structuring, electrical insulation or cell formation of substrates, or thermal treatment of substrates and for lamination or contacting substrates; in line machine systems, namely, machines and machine tools for coating, surface treatment, thermal treatment, plasma treatment, spraying, vacuum deposition, lacquering, cleaning, etching in the nature of in-line machines for wet chemical treatment, for etching, cleaning, coating and drying thin-film solar cells or glass or silicon substrates, semiconductor devices and optical componentsACTIVE
009Downloadable industrial automation software for use in controlling automated machines; downloadable and recorded software featuring artificial intelligence and machine learning for use in the operation of automated machines; downloadable software featuring artificial intelligence for use in condition monitoring of machines; Downloadable factory automation software, namely, software to integrate manufacturing machine operations, track problems and generate production reports; Measuring apparatus and instruments for measuring layer thickness, reflection of light and electromagnetic waves, sound waves, transmission of light and electromagnetic waves, namely, spectrometers; measuring apparatus and instruments for measuring sheet resistance with two or four pin probes or eddy current probes; measuring apparatus and instruments for measuring material composition of optical storage media, CDs, and DVDs, glass, solar cells, planar and three-dimensional substrates, in particular plastic, glass, ceramic or metal substrates, layers, in particular transparent, conductive, metallic, semi-conductive, non-conductive, dielectric, transparent and electrically conductive or passivating layers, single and polycrystalline thin films media, UV curable lacquer, metals, metal alloys, metal oxides or metal nitrides, thin-wall optical parts and micro-structured parts, microfluidic devices, micro electro mechanical structures; magnetic sensors, namely, sensors for measuring the magnetic field of, anisotropic magnetoresistance, giant magnetoresistance and tunnel magnetoresistance structures, semiconductor devices and optical components, none of which are for medical purposesACTIVE
020Receptacles of plastic for commercial use, namely, plastic containers for storing, transporting and processing substrates, in particular silicon wafersACTIVE
037Installation, repair and maintenance of machines for vacuum coating, thermal treatment, lacquering, chemical treatment media supply, automation and combinations thereof as well as component parts of those machines; installation, repair and maintenance of measuring apparatus and instruments being parts of machines and/or machine combinations; installation, repair and maintenance services in relation to measuring, detecting, monitoring and controlling devicesACTIVE

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CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.

Prosecution history

DateCodeEventWhat it means
Nov 14, 2025NREPNEW REPRESENTATIVE AT IB RECEIVED
Aug 29, 2022FINOFINAL DECISION TRANSACTION PROCESSED BY IB
Aug 7, 2022FICSFINAL DISPOSITION NOTICE SENT TO IB
Aug 7, 2022FIMPFINAL DISPOSITION PROCESSED
Jun 8, 2022FICRFINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Mar 8, 2022R.PRREGISTERED-PRINCIPAL REGISTERYour trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive.
Dec 26, 2021GPNXNOTIFICATION PROCESSED BY IB
Dec 21, 2021NPUBOFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Dec 21, 2021PUBOPUBLISHED FOR OPPOSITIONYour mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance.
Dec 1, 2021OPNSNOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Dec 1, 2021OP2RNOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Dec 1, 2021NONPNOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Nov 16, 2021CNSAAPPROVED FOR PUB - PRINCIPAL REGISTER
Nov 15, 2021TEMETEAS/EMAIL CORRESPONDENCE ENTERED
Nov 15, 2021CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
Nov 15, 2021ERFRTEAS REQUEST FOR RECONSIDERATION RECEIVED
Nov 3, 2021RDX3NOTIFICATION FOR REQ FOR RECON DENIED NO APPEAL FILED
Nov 3, 2021RDX1ACTION FOR REQ FOR RECON DENIED NO APPEAL FILED E-MAILED
Nov 3, 2021RRDXACTION REQ FOR RECON DENIED NO APPEAL FILED COUNTED NOT MAILED
Sep 28, 2021TEMETEAS/EMAIL CORRESPONDENCE ENTERED
Sep 28, 2021CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
Sep 28, 2021ERFRTEAS REQUEST FOR RECONSIDERATION RECEIVED
Jul 12, 2021GNFNNOTIFICATION OF FINAL REFUSAL EMAILED
Jul 12, 2021GNFRFINAL REFUSAL E-MAILEDA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Jul 12, 2021CNFRFINAL REFUSAL WRITTENA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Jun 15, 2021TEMETEAS/EMAIL CORRESPONDENCE ENTERED
Jun 14, 2021CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
Jun 14, 2021TROATEAS RESPONSE TO OFFICE ACTION RECEIVEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Jan 4, 2021RFNTREFUSAL PROCESSED BY IB
Dec 17, 2020RFCSNON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Dec 17, 2020RFRRREFUSAL PROCESSED BY MPU
Dec 9, 2020RFCRNON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Dec 8, 2020CNRTNON-FINAL ACTION WRITTENA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Dec 8, 2020DOCKASSIGNED TO EXAMINER
Nov 3, 2020MAFRAPPLICATION FILING RECEIPT MAILED
Oct 28, 2020NWOSNEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Oct 22, 2020REPRSN ASSIGNED FOR SECT 66A APPL FROM IB

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