USPTO serial 79349728
SMARTSIC
Reviewed by CopyMark Law Group
Status 663
- Filing date
- Status date
- Registration date
- —
- Examiner
- ONUOHA, UKACHUKWU FREDERICK
- Law office
- GENERIC WEB UPDATE
What this means
This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.
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Owner
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Mari-Elise Paul
Mari-Elise Paul McBrayer PLLC500 West Jefferson Street, Suite 2400Louisville, KY 40202United StatesGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 009 | Multi-layer substrates being a layered semiconductor; multilayer substrates consisting of semiconductor being a layered semiconductor for optoelectronics, microelectronics, photonics, integrated circuits, radio frequency (RF) or power electronic components, for transistors, thyristors and diodes, for microsystems, for photonic components, for electronic devices for switching or converting electrical currents, for devices conducting or filtering radio frequency electric currents, for piezoelectric devices, for quantum cryptography devices, for light emitting diodes | ACTIVE | — |
| 040 | Treatment of semiconductor materials, namely, mechanical, chemical, physical treatment, polishing and gluing of semiconductor material surfaces all of the above being part of custom manufacture; treatment of semiconductor substrates for microelectronics, optoelectronics, microsystems, radio frequency (RF) or power components, photonics; treatment of materials in the nature of semiconductor wafers and semiconductors; polishing semiconductor wafers; transferring a layer of materials, semiconductors or components to any media being part of custom manufacturing; treatment of materials, namely, ion implantation in materials; treatment of materials, namely, deposing layers of materials, especially Chemical Vapor Deposition or Physical Vapor Deposition of thin layers; treatment of materials, namely, custom manufacturing by sublimation, such as manufacturing by Physical Vapor Transport; treatment of materials, namely, growth of material layers, especially in epitaxy; treatment of materials, namely, manufacturing by powder sintering processes | ACTIVE | — |
| 042 | Testing semiconductor materials; research and development of new products in the field of multilayer substrates, semiconductor wafers and semiconductors for integrated circuits, for electronic radio frequency (RF) or power components, for transistors, thyristors and diodes, for microsystems, for optoelectronic components, for photonic components, for electronic devices for switching or converting electrical currents, for devices conducting or filtering radio frequency electric currents for piezoelectric devices, for quantum cryptography devices, for light emitting diodes; research and development of new products in the field of transferring microelectronic circuits or microsystems on all kinds of media, in the field of material, semiconductor or component layer transfer on all media, in the field of ion implantation in materials, in the field of material layer deposition, especially in epitaxy, in the field of Chemical Vapor Deposition or Physical Vapor Deposition, in the field of sublimation manufacturing such as Physical Vapor Transport, in the field of powder sintering process manufacturing; engineering and engineering services in the field of multilayer substrates, semiconductor wafers and semiconductors for integrated circuits, for electronic radio frequency (RF) or power components, for transistors, thyristors and diodes, for microsystems, for optoelectronic components, for photonic components, for electronic devices for switching or converting electrical currents, or for devices conducting or filtering electric radio frequency currents, for piezoelectric devices, for quantum cryptography devices, for light emitting diodes; engineering and engineering services in the field of transferring microelectronic circuits or microsystems on all kinds of media, in the field of material, semiconductor or component layer transfer on all media, in the field of ion implantation in materials, in the field of material layer deposition, especially in epitaxy, in the field of Chemical Vapor Deposition or Physical Vapor Deposition in the field of sublimation manufacturing such as Physical Vapor Transport, in the field of powder sintering process manufacturing; technical assistance and support services, namely, technical engineering advice for the development of new products in the field of multilayer substrates, semiconductor wafers and semiconductors for integrated circuits, for electronic radio frequency (RF) or power components, for transistors, thyristors and diodes, for microsystems, for optoelectronic components, for photonic components, for electronic devices for switching or converting electrical currents, or for devices conducting or filtering radio frequency electric currents, for piezoelectric devices, for quantum cryptography devices, for light emitting diodes; technical assistance and support services, namely, technical engineering advice for the field of transferring microelectronic circuits or microsystems on all kinds of media, in the field of material layer transfer, semiconductors or components on all media, in the field of ion implantation in materials, in the field of layer deposition of materials, especially in epitaxy, in the field of Chemical Vapor Deposition or Physical Vapor Deposition, in the field of sublimation manufacturing such as being Physical Vapor Transport, in the field of powder sintering process manufacturing | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| May 21, 2024 | CORR | CORRECTION FROM IB ENTERED - NO REVIEW REQUIRED | — |
| Apr 29, 2024 | CRCV | CORRECTION TRANSACTION RECEIVED FROM IB | — |
| Apr 11, 2024 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Apr 11, 2024 | ECDR | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | — |
| Apr 11, 2024 | ARAA | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Apr 11, 2024 | REAP | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | — |
| Apr 11, 2024 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Apr 11, 2024 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Apr 11, 2024 | ERFR | TEAS REQUEST FOR RECONSIDERATION RECEIVED | — |
| Mar 11, 2024 | OPNX | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB | — |
| Feb 21, 2024 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Feb 21, 2024 | OPNR | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB | — |
| Dec 6, 2023 | DOCK | ASSIGNED TO EXAMINER | — |
| Oct 11, 2023 | GNFN | NOTIFICATION OF FINAL REFUSAL EMAILED | — |
| Oct 11, 2023 | GNFR | FINAL REFUSAL E-MAILED | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Oct 11, 2023 | CNFR | FINAL REFUSAL WRITTEN | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Sep 19, 2023 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Sep 18, 2023 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Sep 18, 2023 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Apr 13, 2023 | RFNT | REFUSAL PROCESSED BY IB | — |
| Mar 19, 2023 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Mar 19, 2023 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Jan 25, 2023 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Jan 24, 2023 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jan 18, 2023 | DOCK | ASSIGNED TO EXAMINER | — |
| Sep 20, 2022 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Sep 16, 2022 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Sep 15, 2022 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |