USPTO serial 79360593
LASERTEC
Reviewed by CopyMark Law Group
- Filing date
- Status date
- Registration date
- May 7, 2024
- Examiner
- HUSSAIN, TASNEEM
- Law office
- FILE REPOSITORY (FRANCONIA)
What this means
Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six. Calendar Section 8 between years five and six, and consider trademark monitoring.
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If you own this trademark, we can monitor new filings and help with USPTO deadlines. If you do not, we can file a new U.S. application.
Current trademark owner
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Owner
Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays | ACTIVE | — |
| 009 | Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by Lasertec Corporation
- Other trademarks owned by Lasertec Corporation
- Other trademarks owned by Lasertec Corporation
- Other trademarks in Class 007
- Other trademarks in Class 009
- Similar marks named LASERTEC
- Recently changed USPTO trademarks
- Recently filed trademarks
- Browse all trademark records
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Nov 23, 2024 | FINO | FINAL DECISION TRANSACTION PROCESSED BY IB | — |
| Nov 3, 2024 | FICS | FINAL DISPOSITION NOTICE SENT TO IB | — |
| Nov 2, 2024 | FIMP | FINAL DISPOSITION PROCESSED | — |
| Aug 7, 2024 | FICR | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | — |
| May 7, 2024 | NRCC | NOTICE OF REGISTRATION CONFIRMATION EMAILED | — |
| May 7, 2024 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Mar 4, 2024 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Feb 26, 2024 | GPNX | NOTIFICATION PROCESSED BY IB | — |
| Feb 20, 2024 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Feb 7, 2024 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Feb 7, 2024 | OP2R | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | — |
| Feb 3, 2024 | NREP | NEW REPRESENTATIVE AT IB RECEIVED | — |
| Jan 31, 2024 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Jan 31, 2024 | NONP | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | — |
| Jan 17, 2024 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jan 2, 2024 | XAEC | EXAMINER'S AMENDMENT ENTERED | — |
| Jan 2, 2024 | GNEN | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | — |
| Jan 2, 2024 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| Jan 2, 2024 | CNEA | EXAMINERS AMENDMENT -WRITTEN | — |
| Dec 8, 2023 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Dec 7, 2023 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Dec 7, 2023 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Jul 20, 2023 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Jul 20, 2023 | ECDR | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | — |
| Jul 20, 2023 | ARAA | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Jul 20, 2023 | REAP | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | — |
| Jul 20, 2023 | CHAN | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | — |
| Jul 20, 2023 | COAR | TEAS CHANGE OF OWNER ADDRESS RECEIVED | — |
| Jul 11, 2023 | RFNT | REFUSAL PROCESSED BY IB | — |
| Jun 20, 2023 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Jun 20, 2023 | RFRR | REFUSAL PROCESSED BY MPU | — |
| May 11, 2023 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| May 10, 2023 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| May 9, 2023 | DOCK | ASSIGNED TO EXAMINER | — |
| Jan 24, 2023 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Jan 20, 2023 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Jan 20, 2023 | LIMI | LIMITATION FROM ORIGINAL APPLICATION ENTERED | — |
| Jan 19, 2023 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |