USPTO serial 79433213
FIAMMETTA
Reviewed by CopyMark Law Group
Status 645Office Action
- Filing date
- Status date
- Registration date
- —
- Examiner
- SEVERSON, JUSTIN
- Law office
- TMO LAW OFFICE 111
What this means
The USPTO has issued an Office Action on this application. A response is typically required before the deadline, or the application can be abandoned.
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Owner
Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 009 | Scientific research and laboratory apparatus, namely, high-temperature chemical vapor deposition (HTCVD) devices, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems comprised of reactors, coils, retorts and crackers for use in high temperature chemical reactions; educational apparatus and simulators, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems comprised of reactors, coils, retorts and crackers for use in high temperature chemical reactions; measuring, detecting, monitoring and controlling devices, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, namely, optical inspection apparatus and electronic imaging platforms for inspection of semiconductor wafers, reticles, and photomasks, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; testing and quality control devices, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, namely, optical inspection apparatus and electronic imaging platforms for inspection of semiconductor wafers, reticles, and photomasks, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; scientific, research, surveying, optical, weighing, measuring, signaling, detecting, testing, inspecting, and teaching apparatus and instruments, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems comprised of reactors, coils, retorts and crackers for use in high temperature chemical reactions, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, namely, optical inspection apparatus and electronic imaging platforms for inspection of semiconductor wafers, reticles, and photomasks, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; semiconductor devices; integrated circuits, semiconductor chips, and wafers; semiconductors; semiconductor testing apparatus; electronic components in the nature of electric contactors; transistors, diodes, and electric resistors; downloadable computer software for use in processing semiconductor wafers; recorded computer software for use in processing semiconductor wafers; downloadable computer software for the testing, analysis, production, manufacture, operation, and optimization of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, and silicon wafers; recorded computer software for the testing, analysis, production, manufacture, operation, and optimization of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, and silicon wafers; downloadable computer software for photolithography, microlithography, and electronic design automation (EDA); recorded computer software for photolithography, microlithography, and electronic design automation (EDA); downloadable software for designing and simulating semiconductor devices; recorded software for designing and simulating semiconductor devices; downloadable software used for simulating and optimizing the crystal growth process; recorded software used for simulating and optimizing the crystal growth process; downloadable software for monitoring, analysing, controlling and running physical world operations of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, silicon wafers, photolithography, microlithography, and electronic design automation (EDA); recorded software for monitoring, analysing, controlling and running physical world operations of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, silicon wafers, photolithography, microlithography, and electronic design automation (EDA); scientific instruments, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems comprised of reactors, coils, retorts and crackers for use in high temperature chemical reactions, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, namely, optical inspection apparatus and electronic imaging platforms for inspection of semiconductor wafers, reticles, and photomasks, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; apparatus, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, namely, optical inspection apparatus and electronic imaging platforms for inspection of semiconductor wafers, reticles, and photomasks, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers for testing and measuring semiconductor materials; apparatus, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, namely, optical inspection apparatus and electronic imaging platforms for inspection of semiconductor wafers, reticles, and photomasks, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers for testing and measuring the quality and properties of the grown SiC crystals; electrical test apparatus, namely, electronic apparatus for testing the electrical conductivity of semiconductors; equipment for conducting, switching, transforming, accumulating, regulating or controlling electricity, namely, electricity limiters, electricity meters, electricity conduits, electricity distribution consoles, electrical switches, electrical transformers; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling the distribution or use of electricity and electric current; equipment for conducting, switching, transforming, accumulating, regulating or controlling the distribution or use of electricity | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Jul 31, 2026 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Jul 31, 2026 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Jul 31, 2026 | ERFR | TEAS REQUEST FOR RECONSIDERATION RECEIVED | — |
| Jul 23, 2026 | GNFN | NOTIFICATION OF FINAL REFUSAL EMAILED | — |
| Jul 23, 2026 | GNFR | FINAL REFUSAL E-MAILED | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Jul 23, 2026 | CNFR | FINAL REFUSAL WRITTEN | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| May 31, 2026 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| May 31, 2026 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| May 31, 2026 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Feb 19, 2026 | RFNT | REFUSAL PROCESSED BY IB | — |
| Feb 5, 2026 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Feb 5, 2026 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Jan 9, 2026 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Jan 8, 2026 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Dec 29, 2025 | DOCK | ASSIGNED TO EXAMINER | — |
| Sep 29, 2025 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Sep 29, 2025 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Sep 29, 2025 | LIMI | LIMITATION FROM ORIGINAL APPLICATION ENTERED | — |
| Sep 25, 2025 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |