USPTO serial 74646203
STEAG MICROTECH
Reviewed by CopyMark Law Group
Reg. 2056612Status 711
- Filing date
- Status date
- Registration date
- Apr 29, 1997
- Examiner
- LYKOS, ANGELA
- Law office
- FILE REPOSITORY (FRANCONIA)
What this means
This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.
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Owner
PLIEZHAUSEN, DE
STEAG MicroTech GmbH Sternenfels
D-75447 Sternenfels, DE
STEAG MicroTech GmbH Sternenfels
D-75447 Sternenfels, DE
STEAG MicroTech GmbH Sternenfels
D-75447 Sternenfels, DE
STEAG MicroTech GmbH Donaueschingen
D-78166 Donaueschingen, DE
Other trademarks owned by STEAG MicroTech GmbH Donaueschingen
STEAG MicroTech GmbH Donaueschingen
D-78166 Donaueschingen, DE
Other trademarks owned by STEAG MicroTech GmbH Donaueschingen
STEAG MicroTech GmbH Donaueschingen
D-78166 Donaueschingen, DE
Other trademarks owned by STEAG MicroTech GmbH Donaueschingen
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Robert W. Becker
ROBERT W BECKER ROBERT W BECKER & ASSOCIATES707 HWY 66 STE BTIJERAS, NM 87059UNITED STATESGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-Roms and solar cells; drying and wet processing apparatus for treating semiconductor susbstrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-Roms and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor | SECTION 7(e) - CANCELLED | — |
| 037 | installation and maintenance for others of the following items - mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor | SECTION 7(e) - CANCELLED | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by STEAG MICROTECH GMBH
- Other trademarks owned by STEAG MicroTech GmbH Sternenfels
- Other trademarks owned by STEAG MicroTech GmbH Sternenfels
- Other trademarks owned by STEAG MicroTech GmbH Sternenfels
- Other trademarks owned by STEAG MicroTech GmbH Donaueschingen
- Other trademarks owned by STEAG MicroTech GmbH Donaueschingen
- Other trademarks owned by STEAG MicroTech GmbH Donaueschingen
- Other trademarks in Class 007
- Other trademarks in Class 037
- Similar marks named STEAG MICROTECH
- Recently changed USPTO trademarks
- Recently filed trademarks
- Browse all trademark records
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Oct 16, 2003 | C7.. | CANCELLED SECTION 7-TOTAL | — |
| Jun 30, 2003 | C7RF | REQUEST FOR SECT 7 TOTAL SURRENDER FILED | — |
| Mar 16, 1999 | COC. | CORRECTION UNDER SECTION 7 - PROCESSED | — |
| Sep 14, 1998 | RRPR | RESPONSE RECEIVED TO POST REG. ACTION | — |
| Jul 1, 1998 | PRAM | POST REGISTRATION ACTION MAILED - SEC. 7 | — |
| Mar 18, 1998 | AMD7 | SEC 7 REQUEST FILED | — |
| Apr 29, 1997 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Feb 4, 1997 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Jan 4, 1997 | NPUB | NOTICE OF PUBLICATION | — |
| Oct 23, 1996 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jul 22, 1996 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Jul 22, 1996 | CNSL | LETTER OF SUSPENSION MAILED | — |
| Jun 13, 1996 | CNEA | EXAMINER'S AMENDMENT MAILED | — |
| Feb 27, 1996 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Sep 18, 1995 | CNRT | NON-FINAL ACTION MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Aug 23, 1995 | DOCK | ASSIGNED TO EXAMINER | — |