USPTO serial 76236977
KRONOS
Reviewed by CopyMark Law Group
- Filing date
- Status date
- Registration date
- Apr 9, 2002
- Examiner
- FRYE, KIMBERLY
- Law office
- SCANNING ON DEMAND
What this means
Status 710 means the registration was cancelled because a required Section 8 declaration of continued use was not filed within the deadline (including any grace period). The federal registration is no longer active. Evaluate filing a new application if you still use the mark, or petition if cancellation was erroneous. Consult counsel on remaining common-law rights.
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Owner
72124 Pliezhausen, DE
72124 Pliezhausen, DE
72124 Pliezhausen, DE
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Robert W. Becker
ROBERT W BECKER ROBERT W BECKER & ASSOCIATES11896 N HWY 14 STE BTIJERAS, NM 87059UNITED STATESGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Machines for the manufacture of semiconductor substrates, silicon disks, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation of ozonized water or ozone by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal display, solar cells, as machine parts | SECTION 8 - CANCELLED | — |
| 011 | Drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces | SECTION 8 - CANCELLED | — |
| 037 | Installation and servicing of the following machines and units; machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces | SECTION 8 - CANCELLED | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by STEAG Micro Tech GmbH
- Other trademarks owned by STEAG Micro Tech GmbH
- Other trademarks owned by STEAG Micro Tech GmbH
- Other trademarks in Class 007
- Other trademarks in Class 011
- Other trademarks in Class 037
- Similar marks named KRONOS
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Jan 17, 2009 | C8.. | CANCELLED SEC. 8 (6-YR) | — |
| Jan 2, 2008 | ASCK | ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY | — |
| May 21, 2007 | CFIT | CASE FILE IN TICRS | — |
| Apr 9, 2002 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Jan 15, 2002 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Dec 26, 2001 | NPUB | NOTICE OF PUBLICATION | — |
| Nov 7, 2001 | 44DD | SEC. 44(D) CLAIM DELETED | — |
| Aug 25, 2001 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jul 11, 2001 | CNEA | EXAMINER'S AMENDMENT MAILED | — |
| Jul 5, 2001 | DOCK | ASSIGNED TO EXAMINER | — |
| May 7, 2001 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |