USPTO serial 77594285
JUSUNG
Reviewed by CopyMark Law Group
- Filing date
- Status date
- Registration date
- Oct 20, 2009
- Examiner
- HACK, ANDREA R
- Law office
- GENERIC WEB UPDATE
What this means
Status 800 means the registration was renewed after acceptable combined Section 8 and Section 9 filings. The mark remains registered for another 10-year term with active federal protection. Calendar the next Section 8 and 9 deadline in 10 years and maintain monitoring.
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Owner
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Rebecca A. Liebowitz
Rebecca A. Liebowitz VENABLE LLPVENABLE LLPWASHINGTON, DC 20043-9998UNITED STATESGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Semiconductor processing machines; Semiconductor wafer processing machines; Atomic layer deposition (ALD) machines; Chemical vapor deposition (CVD) machines; Ultra high vacuum chemical vapor deposition (CVD) machines; Low pressure chemical vapor deposition (CVD) machines; Metal organic chemical vapor deposition (CVD) machines; [ Rapid thermal chemical vapor deposition (CVD) machines; High temperature chemical vapor deposition (CVD) machines; Atmospheric pressure chemical vapor deposition (CVD) machines; Middle pressure chemical vapor deposition (CVD) machines; Diffusion machines used for semiconductor manufacturing; ] Plasma enhanced chemical vapor deposition (PECVD) machines; Plasma chemical vapor deposition (PCVD) machines; [ Vapor epitaxial growth machines used for semiconductor manufacturing; Liquid epitaxial growth machines used for semiconductor manufacturing; Oxidation machines used for semiconductor manufacturing; Anealing machines used for semiconductor manufacturing; ] Deposition machines used for semiconductor manufacturing; Etching machines used for semiconductor manufacturing; [ Sputtering machines used for semiconductor manufacturing; Photolithography machines used for semiconductor manufacturing; Developing machines used for semiconductor manufacturing; Ashing machines used for semiconductor manufacturing; Cleaning machines used for semiconductor manufacturing; Polishing machines used for semiconductor manufacturing; ] Deposition machines used for liquid crystal display (LCD) manufacturing; [ Etching machines used for liquid crystal display (LCD) manufacturing; Sputtering machines used for liquid crystal display (LCD) manufacturing; Photolithography machines used for liquid crystal display (LCD) manufacturing; Developing machines used for liquid crystal display (LCD) manufacturing; Ashing machines used for liquid crystal display(LCD) manufacturing; Cleaning machines used for liquid crystal display (LCD) manufacturing; Polishing machines used for liquid crystal display (LCD) manufacturing; ] Deposition machines used for solar cells manufacturing; Etching machines used for solar cells manufacturing [ ; Sputtering machines used for solar cells manufacturing; Photolithography machines used for solar cells manufacturing; Developing machines used for solar cells manufacturing; Ashing machines used for solar cells manufacturing; Cleaning machines used for solar cells manufacturing; Polishing machines used for solar cells manufacturing ] | ACTIVE | — |
| 037 | Installation, maintenance and repair of semiconductor processing machines and systems; Installation, maintenance and repair of semiconductor wafer processing machines; Installation, maintenance and repair of atomic layer deposition (ALD) machines; Installation, maintenance and repair of chemical Vapor Deposition (CVD) machines; Installation, maintenance and repair of ultra high vacuum chemical vapor deposition (CVD) machines; Installation, maintenance and repair of low pressure chemical vapor deposition (CVD) machines; Installation, maintenance and repair of metal organic chemical vapor deposition (CVD) machines; [ Installation, maintenance and repair of rapid thermal chemical vapor deposition (CVD) machines; Installation, maintenance and repair of high temperature chemical vapor deposition (CVD) machines; Installation, maintenance and repair of atmospheric pressure chemical vapor deposition (CVD) machines; Installation, maintenance and repair of middle pressure chemical vapor deposition (CVD) machines; Installation, maintenance and repair of diffusion machines used for semiconductor manufacturing; ] Installation, maintenance and repair of plasma enhanced chemical vapor deposition (PECVD) machines; Installation, maintenance and repair of plasma chemical vapor deposition (PCVD) machines; [ Installation, maintenance and repair of vapor epitaxial growth machines used for semiconductor manufacturing; Installation, maintenance and repair of liquid epitaxial growth machines used for semiconductor manufacturing; Installation, maintenance and repair of oxidation machines used for semiconductor manufacturing; Installation, maintenance and repair of Anealing machines used for semiconductor manufacturing; ] Installation, maintenance and repair of deposition machines used for semiconductor manufacturing; [ Installation, maintenance and repair of etching machines used for semiconductor manufacturing; Installation, maintenance and repair of sputtering machines used for semiconductor manufacturing; Installation, maintenance and repair of photolithography machines used for semiconductor manufacturing; Installation, maintenance and repair of developing machines used for semiconductor manufacturing; Installation, maintenance and repair of ashing machines used for semiconductor manufacturing; Installation, maintenance and repair of cleaning machines used for semiconductor manufacturing; Installation, maintenance and repair of polishing machines used for semiconductor manufacturing; ] Installation, maintenance and repair of deposition machines used for liquid crystal display (LCD) manufacturing; [ Installation, maintenance and repair of etching machines used for liquid crystal display (LCD) manufacturing; Installation, maintenance and repair of sputtering machines used for liquid crystal display (LCD) manufacturing; Installation, maintenance and repair of photolithography machines used for liquid crystal display (LCD) manufacturing; Installation, maintenance and repair of developing machines used for liquid crystal display (LCD) manufacturing; Installation, maintenance and repair of ashing machines used for liquid crystal display (LCD) manufacturing; Installation, maintenance and repair of cleaning machines used for liquid crystal display (LCD) manufacturing; Installation, maintenance and repair of polishing machines used for liquid crystal display (LCD) manufacturing; ] Installation, maintenance and repair of deposition machines used for solar cells manufacturing; Installation, maintenance and repair of etching machines used for solar cells manufacturing [ ; Installation, maintenance and repair of sputtering machines used for solar cells manufacturing; Installation, maintenance and repair of photolithography machines used for solar cells manufacturing; Installation, maintenance and repair of developing machines used for solar cells manufacturing; Installation, maintenance and repair of ashing machines used for solar cells manufacturing; Installation, maintenance and repair of cleaning machines used for solar cells manufacturing; Installation, maintenance and repair of polishing machines used for solar cells manufacturing ] | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by JUSUNG engineering Co. Ltd.
- Other trademarks owned by JUSUNG engineering Co. Ltd.
- Other trademarks owned by JUSUNG engineering Co. Ltd.
- Other trademarks in Class 007
- Other trademarks in Class 037
- Similar marks named JUSUNG
- Recently changed USPTO trademarks
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Dec 21, 2020 | NA89 | NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED | — |
| Dec 21, 2020 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Dec 21, 2020 | RNL1 | REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS) | The trademark registration was renewed for another 10-year term after acceptable maintenance filings. RNL1, RNL2, and RNL3 indicate which renewal cycle (first, second, or third 10-year term) was recorded. The registration remains active. |
| Dec 21, 2020 | 89AG | REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED | The USPTO accepted your combined Section 8 declaration and Section 9 renewal application. The registration is renewed for another 10-year term. The next combined maintenance filing will be due at the following 10-year anniversary. |
| Jul 9, 2020 | CHAN | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | — |
| Jul 9, 2020 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Jul 9, 2020 | ECDR | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | — |
| Jul 9, 2020 | ARAA | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Jul 9, 2020 | REAP | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | — |
| Jul 9, 2020 | COAR | TEAS CHANGE OF OWNER ADDRESS RECEIVED | — |
| Dec 20, 2019 | EROP | TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED | — |
| Jun 25, 2019 | PR89 | POST REGISTRATION ACTION MAILED - SEC. 8 & 9 | — |
| Jun 24, 2019 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Jun 5, 2019 | E89R | TEAS SECTION 8 & 9 RECEIVED | — |
| Nov 2, 2015 | NAS8 | NOTICE OF ACCEPTANCE OF SEC. 8 - MAILED | — |
| Nov 2, 2015 | 8.OK | REGISTERED - SEC. 8 (6-YR) ACCEPTED | The USPTO accepted your Section 8 declaration showing the mark is still in use in commerce (or excusable nonuse). This satisfies the six-year maintenance requirement and keeps the registration active until the next renewal deadline. |
| Nov 2, 2015 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Oct 19, 2015 | 8.AF | REGISTERED - SEC. 8 (6-YR) FILED | — |
| Oct 19, 2015 | PAPER RECEIVED | — | |
| Jan 24, 2010 | CHAN | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | — |
| Jan 24, 2010 | COAR | TEAS CHANGE OF OWNER ADDRESS RECEIVED | — |
| Oct 20, 2009 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Aug 4, 2009 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Jul 15, 2009 | NPUB | NOTICE OF PUBLICATION | — |
| Jul 1, 2009 | PREV | LAW OFFICE PUBLICATION REVIEW COMPLETED | — |
| Jun 24, 2009 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jun 12, 2009 | CNFR | FINAL REFUSAL MAILED | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Jun 11, 2009 | CNFR | FINAL REFUSAL WRITTEN | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| May 22, 2009 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| May 22, 2009 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| May 21, 2009 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Jan 21, 2009 | CNRT | NON-FINAL ACTION MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jan 16, 2009 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jan 16, 2009 | DOCK | ASSIGNED TO EXAMINER | — |
| Nov 18, 2008 | AMPX | PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED | — |
| Nov 18, 2008 | ALIE | ASSIGNED TO LIE | — |
| Nov 5, 2008 | PAPER RECEIVED | — | |
| Oct 20, 2008 | NWAP | NEW APPLICATION ENTERED | — |