USPTO serial 78096898
DEFINITY
Reviewed by CopyMark Law Group
Reg. 2770322Status 710
- Filing date
- Status date
- Registration date
- Sep 30, 2003
- Examiner
- WILLIAMS, IRENE
- Law office
- POST REGISTRATION
What this means
Status 710 means the registration was cancelled because a required Section 8 declaration of continued use was not filed within the deadline (including any grace period). The federal registration is no longer active. Evaluate filing a new application if you still use the mark, or petition if cancellation was erroneous. Consult counsel on remaining common-law rights.
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Owner
ROUND ROCK, TX
Round Rock, TX
Round Rock, TX
Round Rock, TX
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Dwayne K. Goetzel
DWAYNE K GOETZEL MEYERTONS HOOD KIVLIN KOWERT ET ALPO BOX 398AUSTIN, TX 78767-0398UNITED STATESGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Power equipment, namely, pattern generators, etch tools, inspection tools, metrology tools, repair tools, and photoresists, used for the manufacture of photomasks, the optical transfer of integrated circuit images onto semiconductor wafers, and for altering and blocking light as applied to photomasks | SECTION 8 - CANCELLED | Jul 22, 2002 |
| 021 | Clear substrates, namely, glass or quartz, imaged with device layers for exposing silicon substrates; quartz or glass substrates imaged with microscopic structures in the manufacture of intergrated circuits, micro-electrical mechanical structures (MEMS), optical components and systems | SECTION 8 - CANCELLED | Jul 22, 2002 |
| 040 | [Customer] *Custom* manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks | SECTION 8 - CANCELLED | Jul 22, 2002 |
| 042 | Photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass | SECTION 8 - CANCELLED | Jul 22, 2002 |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by TOPPAN PHOTOMASKS, INC.
- Other trademarks owned by Dupont Photomasks, Inc.
- Other trademarks owned by Dupont Photomasks, Inc.
- Other trademarks owned by Dupont Photomasks, Inc.
- Other trademarks in Class 007
- Other trademarks in Class 021
- Other trademarks in Class 040
- Other trademarks in Class 042
- Similar marks named DEFINITY
- Recently changed USPTO trademarks
- Recently filed trademarks
- Browse all trademark records
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| May 8, 2010 | C8.. | CANCELLED SEC. 8 (6-YR) | — |
| Jul 27, 2005 | COC. | CORRECTION UNDER SECTION 7 - PROCESSED | — |
| May 6, 2005 | COC. | CORRECTION UNDER SECTION 7 - PROCESSED | — |
| Mar 22, 2004 | AMD7 | SEC 7 REQUEST FILED | — |
| Mar 19, 2004 | AMD7 | SEC 7 REQUEST FILED | — |
| Sep 30, 2003 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Aug 26, 2003 | PAPER RECEIVED | — | |
| Aug 7, 2003 | CNPR | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED | — |
| Jul 17, 2003 | CFIT | CASE FILE IN TICRS | — |
| Jul 9, 2003 | SUPC | STATEMENT OF USE PROCESSING COMPLETE | — |
| Jun 30, 2003 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Jun 30, 2003 | PAPER RECEIVED | — | |
| Jun 24, 2003 | IUAF | USE AMENDMENT FILED | — |
| Jun 24, 2003 | EISU | TEAS STATEMENT OF USE RECEIVED | The applicant filed a Statement of Use with specimens showing the mark in actual commerce. The USPTO will review the filing for compliance. If accepted, the mark can proceed to registration; if deficient, the USPTO may issue a requirement or office action. |
| Feb 10, 2003 | PAPER RECEIVED | — | |
| Feb 7, 2003 | PAPER RECEIVED | — | |
| Dec 24, 2002 | NOAM | NOA MAILED - SOU REQUIRED FROM APPLICANT | A Notice of Allowance means your intent-to-use application cleared examination and opposition but is not registered yet. You must file a Statement of Use showing the mark in commerce, or request an extension, before the deadline — usually six months from the notice date. |
| Oct 1, 2002 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Sep 11, 2002 | NPUB | NOTICE OF PUBLICATION | — |
| Jul 22, 2002 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jul 9, 2002 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| Jun 3, 2002 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Mar 14, 2002 | GNRT | NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Mar 11, 2002 | DOCK | ASSIGNED TO EXAMINER | — |