Drawing for MATHESON TRI-GAS

USPTO serial 78488698

MATHESON TRI-GAS

Reviewed by CopyMark Law Group

Reg. 3125771Status 800Renewal
Filing date
Status date
Registration date
Aug 8, 2006
Examiner
DINALLO, KEVIN M
Law office
GENERIC WEB UPDATE

What this means

This registration is in, or will soon enter, a USPTO maintenance window. Missing a Section 8 or Section 9 filing can cancel the registration.

Status 800: Status 800 means the registration was renewed after acceptable combined Section 8 and Section 9 filings. The mark remains registered for another 10-year term with active federal protection.

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Owner

Attorney of record

The USPTO lists this attorney as the applicant's representative for correspondence on this application.

DEEPAK NAMBIAR

DEEPAK NAMBIAR KELLEY DRYE & WARREN LLP101 PARK AVENEW YORK, NY 10178-0002UNITED STATES

Goods and services

ClassDescriptionStatusFirst use
001Gases for general industrial use, namely, 1,1,1,2-tetrafluoroethane; 1,1,1-trichioro-2,2,2-trifluoroethane; 1,1,1-trichloroethane; 1,1,2,2-tetrachloroethane; 1,1,2-trichloro-1,2,2-trifluoroethane; 1,1,2-trichloroethane; 1,1-dichloroethylene; 1,1-difluoroethane; 1,2-dichiorotetrafluoroethane; 1,3 butadiene; 1-butene; 1-chloro-2-propanol; 1-chloropropane; 1-hexene; 1-octene; 1-pentene; 2,2,4-trimethylpentane; 2,3-dimethylbutane; 2,4-dimethylpentane; 2,5-dimethyithiophene; 2-ethylbutene-1; 2-hexene; 2-methyl butraldehyde; 2-methyl-1-butene; 2-methyl-2-butene; 2-methylbutane; 2-methyihexane; 2-methylpentane; 2-methyithiophene; 2-pentene; 2-propanol; 3,3-dimethyl-1-butene; 3-methyl-1-butene; 3-methylpentane; 4-methyl-1-pentene; 4-vinylcyclohexene; carbon monoxide; carbon dioxide and nitrogen; ethanol in air; acetaldehyde; acetone; acetonitrile; acetylacetone; acetylene; acrolein; acrylonitrile; [ acrylonitrile;] compressed air; allene; ammonia; antimony pentafluoride; argon; argon and carbon dioxide mixture; argon and helium mixture; argon and oxygen mixture; arsenic fluoride; arsenic pentafluoride; arsine; benzene; benzoic acid; benzyl-D7 chionde; [ bis, 2-methoxyethyl adipate;] boron trichloride; boron trifluoride; bromine pentafluoride; bromine trifluoride; bromochiorodifluoromethane; bromotrifluoroethylene; butadiene; butyl benzene; butyl mercaptan; butyl nitrate; calibration gas; carbon dioxide; carbon dioxide in argon and helium mixture; carbon disulfide; carbon monoxide; carbon monoxide in air; carbon monoxide in nitrogen; carbontetrachloride; carbonyl fluoride; carbonyl sulfide; [ alpha-hydro-omega-hydroxy-poly(oxy-1,2-ethanediyl); ] chlorine; chlorine trifluoride; multi component mixture containing volatile organics in trace quantities with balance gas nitrogen; chlorobenzene; chlorodifluoromethane; chloroform; chloroiodomethane; chloropentafluoroethane; chlorotrifluoromethane; cinnamaldehyde; cis-1,2-dichloroethylene; cis-2-butene; cis-2-pentene; cumene; cyanogen; cyanogen chloride; cyclohexane; cyclohexanone; cyclopentane; cyclopropane; deuterium; diborane; dibromomethane; dibutyl ether; dichlorodifluoromethane; dichloromethane; dichloromonofluoromethane; dichiorosilane; dichlorotetrafluoroethane; diethyl disufide; diethyl telluride; difluorodibromomethane; difluoromonochloroethane; digermane; dimethyl ether; dimethyl sulfate; dimethyl sulfide; dimethyl sulfoxide; dimethylamine; dimethyl zinc; dipropyl ether; disilane; dodecane; 2-chloro-1-difluoromethoxy-1,1,2-trifluoroethane; ethane; ethanol; ethyl acetate; ethyl acetylene; ethyl acrylate; ethyl alcohol; ethyl benzene; ethyl chloride; ethyl cyclohexane; ethyl ether; ethyl formate; ethyl mercaptan; ethyl methyl sulfide; ethyl sulfide; ethylamine; ethylene; ethylene dichloride; ethylene glycol; ethylene glycol dimethyl ether; ethylene glycol monomethyl ether; ethylene oxide and nitrogen; ethyleneoxide; fluorine; trifluoromethane; fluorotrichloromethane; 2-chloro-2-difluoromethoxy-1,1,1-trifluoroethane; formaldehyde gas; furan; furfuryl alcohol; germanium tetrachloride; germanium tetrahydride; trichlorofluoromethane; chlorotrifluoroethylene; trichlorotrifluoroethane; 1,2-dichloro-1,1,2,2-tetrafluoroethane; hexafluoroethane; dichlorodifluoromethane; chlorotrifluoromethane; 1,1,1,2-tetrafluoroethane; bromotrifluoromethane; carbon tetrafluoride; monochlorodifluoromethane; trifluoromethane; octafluorocyclobutane; 1,1,1-trifluoro-2-chloro-2-bromoethane; helium; heptane; hexafluoroethane; hexafluoropropene; [ hexafluorpropylene; ]hydriodic acid; hydrogen; hydrogen bromide; hydrogen chloride; hydrogen cyanide; hydrogen fluoride; hydrogen selenide; hydrogen sulfide; hydrogen iodide; iodine pentafluoride; isobutane; isobutene; isobutyl alcohol; isobutyl nitrate; isobutylene; isohexene; isopentane; isoprene; isopropyl alcohol; isopropyl chloride; isopropyl ether; isopropyl mercaptan; krypton; methane; methane in argon, helium and nitrogen or air mixture; methane; methane and hydrogen gas mixture; methanol; methoxyflurane; methyl acetate; methyl acetylene; methyl acrylate; methyl alcohol; methyl bromide; methyl chloride; methyl chloroform; methyl disulfide; methyl ethyl ketone; methyl fluoride; methyl formate; methyl iodide; methyl isobutyl ketone; methyl mercaptan; methyl methacrylate; methyl propionate; methyl salicylate; methyl tert-butyl ether; methyl vinyl ketone; dimethoxymethane; methylamine; methylcyclopentane; methylene bromide; methylene fluoride; monomethylamine; m-xylene; n-amylamine; metal oxides and metal chlorides; metal oxides, [ metal bromides absorbed hydrogen bromide on compound,] and hydrogen bromide vapor; metal oxides, metal chlorides, [ absorbed hydrogen chloride on compound,] and hydrogen chloride vapor; organolithium polymer, lithium amide, and anhydrous ammonia; organolithium, sulfur hexafluoride, and lithium hydride; organolithium polymer and lithium hydride; [ metal oxides;] naphthalene; n-butane; n-butyl acetate; n-butyl alcohol; n-butyl sulfide; n-butyraldehyde; n-decane; neohexane; neon; neopentane; n-heptane; n-hexane; nickel carbonyl; nitric oxide; nitric oxide and nitrogen mixture; nitric oxide and sulfur dioxide and nitrogen gas mixture; nitrogen dioxide; nitrogen trifluoride; nitrosyl chloride; nitrous oxide; n-octane; nonane; n-pentane; n-propyl acetate; n-propyl alcohol; octafluorocyclobutane; octafluorocyclopentene; octane; o-dichlorobenzene; oxides of nitrogen in nitrogen; oxygen in nitrogen; oxygen, compressed gas; oxygen and nitrogen gas mixture; o-xylene; pentane; perfluoro-2-butene; perfluoropropane; permanganate and alkali impregnated diatomaceous earth; phosgene; phosphine; phosphine pentafluoride; phosphorus pentafluoride; phosphorus trifluoride, piperidine; tetraethylene glycol dimethyl ether and sodium naphthalene complex; ethylene glycol dimethyl ether and sodium naphthalene complex; propane; propane in air; propane in nitrogen; propionaldehyde; propyl mercaptan; propylene; propylene oxide; p-xylene; pyridine; arsenic fluoride; arsine; boron trifluoride; germanium tetrafluoride; phosphine; silicon tetrafluoride; sec-butyl alcohol; silane; silicon tetrachloride; silicon tetrafluoride; sodium dichromate; [ sodium dispersion in mineral spirits; sodium dispersion in naphthalene; sodium dispersion in transformer oil; sodium metal dispersion in organic solvent; sodium metal; sodium methylate; sodium shot; ] styrene; styrene monomer; sulfur dioxide; sulfur dioxide in air; sulfur dioxide in nitrogen; [ sulfur dioxide and nitrogen mixture;] sulfur hexafluoride; sulfur tetrafluoride; sulfuryl fluoride; tert-butyl chloride; tert-butyl mercaptan; tetrachloroethylene; tetraethylene glycol dimethyl ether; tetraethylorthosilicate; tetrafluoroethylene; tetrafluoromethane; tetrahydrofuran; tetrahydronaplithalene; thiophene; titanium tetrachloride; toluene; trans-1,2-dichloroethylene; trans-2-butene; trans-2-pentene; trans-3-hexene; trans-3-hexene; transition metal salt impregnated diatomaceous earth; trichioroethylene; trichlorsilane; triethyl phosphite; triethylene glycol; trifluorochloroethylene; trifluoromonobromomethane; trimethyl phosphite; trimethylamine; tungsten hexafluoride; undecane; valeraldehyde; vinyl acetate; vinyl bromide; vinyl chloride; vinyl fluoride; vinyl methyl ether; vinylidene chloride; vinylidene fluoride; xenon; zinc arsenide; enriched stable isotopes; stable isotope labeled compounds; and liquefied gases, namely, argon, carbon dioxide, nitrogen oxide, oxygen, and o-dichlorobenzeneACTIVE—
004Gases used as fuelsACTIVE—
005Gases for medical useACTIVE—
009Instruments, namely, [ gas chromatographs, process analyzers, laboratory analyzers, ] gas detectors, safety analyzers, [ spectyophotometers, spectrometers, ] detection systems primarily comprised of gas detectors, gas monitors, gas calibration kits comprised of pressure regulators and flowmeters for field calibration of gas detection systems or portable instrumentation, and [ gas analyzers,] regulators and gauges, and controls and parts thereof for the controlled dispensing and measuring of gases in laboratory and industrial use; flow and level instrumentation, namely, flow meters, mass flow transducers, blenders, gas standards generators, flow-totalizers, rotameters, and control valves for measuring and controlling the flow of gases and for the monitoring and control of gases; apparatus for the handling, measuring, and controlled dispensing of compressed gases from cylinders, namely, control valves, pressure regulators for regulating the handling, measuring, and controlled dispensing of compresses gases and cryogenic liquids, flow meters, and gauges; equipment for gas containment and distribution, namely, gas panels, gas cabinets, gas manifolds, switchover systems primarily comprised of more than one gas source, two regulators and a common discharge line, point-of-use distribution panels, pressure regulators, flow valves, monitors, pressure transducers, and pressure monitors; gas detectors and monitors; [ gas hygrometers; ] welders, in the nature of electric stick metal arc, tungsten inert gas, metal inert gas, plasma, and submerged arc welders, welding electrodes and wire therefor; protective masks, namely, welding masks, gas masks, and dust masks; protective gloves; and mass flow meters for flow sensing of gasesACTIVE—
011Apparatus for the handling, measuring, and controlled dispensing of compressed gases in cylinders, namely, separators for filtering and purifying compressed gases. [, gas scrubbers, oxygen generators ]ACTIVE—

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Prosecution history

DateCodeEventWhat it means
Aug 19, 2026ASGNAUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP—
Aug 8, 2025REM2COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED—
Oct 20, 2016NA89NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED—
Oct 20, 2016RNL1REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)The trademark registration was renewed for another 10-year term after acceptable maintenance filings. RNL1, RNL2, and RNL3 indicate which renewal cycle (first, second, or third 10-year term) was recorded. The registration remains active.
Oct 20, 201689AGREGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTEDThe USPTO accepted your combined Section 8 declaration and Section 9 renewal application. The registration is renewed for another 10-year term. The next combined maintenance filing will be due at the following 10-year anniversary.
Oct 20, 2016APRECASE ASSIGNED TO POST REGISTRATION PARALEGAL—
Aug 5, 2016E89RTEAS SECTION 8 & 9 RECEIVED—
Apr 12, 2012NA85NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - MAILED—
Apr 12, 2012C15AREGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.—
Apr 12, 2012APRECASE ASSIGNED TO POST REGISTRATION PARALEGAL—
Mar 19, 2012E815TEAS SECTION 8 & 15 RECEIVED—
Aug 8, 2006R.PRREGISTERED-PRINCIPAL REGISTERYour trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive.
May 16, 2006PUBOPUBLISHED FOR OPPOSITIONYour mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance.
Apr 26, 2006NPUBNOTICE OF PUBLICATION—
Mar 24, 2006PREVLAW OFFICE PUBLICATION REVIEW COMPLETED—
Mar 24, 2006ALIEASSIGNED TO LIE—
Mar 22, 2006CNSAAPPROVED FOR PUB - PRINCIPAL REGISTER—
Mar 21, 2006ACECAMENDMENT FROM APPLICANT ENTERED—
Mar 2, 2006CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Mar 2, 2006MAILPAPER RECEIVED—
Sep 15, 2005CEAPEXAMINER'S AMENDMENT/PRIORITY ACTION MAILED—
Sep 15, 2005CPEAEXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED—
Apr 26, 2005CEPECOMBINED EXAMINER'S AMENDMENT/PRIORITY ACTION ENTERED—
Apr 26, 2005CEAPEXAMINER'S AMENDMENT/PRIORITY ACTION MAILED—
Apr 25, 2005CPEAEXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED—
Apr 25, 2005DOCKASSIGNED TO EXAMINER—
Sep 30, 2004NWAPNEW APPLICATION ENTERED—

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