USPTO serial 78492654
MATHESON TRI-GAS ASK...THE GAS PROFESSIONALS
Reviewed by CopyMark Law Group
- Filing date
- Status date
- Registration date
- Dec 11, 2007
- Examiner
- DINALLO, KEVIN M
- Law office
- GENERIC WEB UPDATE
What this means
This registration is in, or will soon enter, a USPTO maintenance window. Missing a Section 8 or Section 9 filing can cancel the registration.
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Owner
IRVING, TX, US
Baskin Ridge, NJ, US
Parsippany, NJ, US
Baskin Ridge, NJ, US
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
DEEPAK NAMBIEAR
DEEPAK NAMBIEAR KELLEY DRYE & WARREN LLP101 PARK AVENEW YORK, NY 10178-0002UNITED STATESGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 001 | Gases for general industrial use, namely, 1,1,1,2-tetrafluoroethane; 1,1,1-trichioro-2,2,2-trifluoroethane; 1,1,1-trichloroethane; 1,1,2,2-tetrachloroethane; 1,1,2-trichloro-1,2,2-trifluoroethane; 1,1,2-trichloroethane; 1,1-dichloroethylene; 1,1-difluoroethane; 1,2-dichiorotetrafluoroethane; 1,3 butadiene; 1-butene; 1-chloro-2-propanol; 1-chloropropane; 1-hexene; 1-octene; 1-pentene; 2,2,4-trimethylpentane; 2,3-dimethylbutane; 2,4-dimethylpentane; 2,5-dimethyithiophene; 2-ethylbutene-1; 2-hexene; 2-methyl butraldehyde; 2-methyl-1-butene; 2-methyl-2-butene; 2-methylbutane; 2-methyihexane; 2-methylpentane; 2-methyithiophene; 2-pentene; 2-propanol; 3,3-dimethyl-1-butene; 3-methyl-1-butene; 3-methylpentane; 4-methyl-1-pentene; 4-vinylcyclohexene; carbon monoxide; carbon dioxide and nitrogen; ethanol in air; acetaldehyde; acetone; acetonitrile; acetylacetone; acetylene; acrolein; acrylonitrile; acrylonitrile; compressed air; allene; ammonia; antimony pentafluoride; argon; argon and carbon dioxide mixture; argon and helium mixture; argon and oxygen mixture; arsenic fluoride; arsenic pentafluoride; arsine; benzene; benzoic acid; benzyl-D7 chionde; bis, 2-methoxyethyl adipate; boron trichloride; boron trifluoride; bromine pentafluoride; bromine trifluoride; bromochiorodifluoromethane; bromotrifluoroethylene; butadiene; butyl benzene; butyl mercaptan; butyl nitrate; calibration gas; carbon dioxide; carbon dioxide in argon and helium mixture; carbon disulfide; carbon monoxide; carbon monoxide in air; carbon monoxide in nitrogen; carbontetrachloride; carbonyl fluoride; carbonyl sulfide; alpha-hydro-omega-hydroxy-poly(oxy-1,2-ethanediyl); chlorine; chlorine trifluoride; multi component mixture containing volatile organics in trace quantities with balance gas nitrogen; chlorobenzene; chlorodifluoromethane; chloroform; chloroiodomethane; chloropentafluoroethane; chlorotrifluoromethane; cinnamaldehyde; cis-1,2-dichloroethylene; cis-2-butene; cis-2-pentene; cumene; cyanogen; cyanogen chloride; cyclohexane; cyclohexanone; cyclopentane; cyclopropane; deuterium; diborane; dibromomethane; dibutyl ether; dichlorodifluoromethane; dichloromethane; dichloromonofluoromethane; dichiorosilane; dichlorotetrafluoroethane; diethyl disufide; diethyl telluride; difluorodibromomethane; difluoromonochloroethane; digermane; dimethyl ether; dimethyl sulfate; dimethyl sulfide; dimethyl sulfoxide; dimethylamine; dimethyl zinc; dipropyl ether; disilane; dodecane; 2-chloro-1-difluoromethoxy-1,1,2-trifluoroethane; ethane; ethanol; ethyl acetate; ethyl acetylene; ethyl acrylate; ethyl alcohol; ethyl benzene; ethyl chloride; ethyl cyclohexane; ethyl ether; ethyl formate; ethyl mercaptan; ethyl methyl sulfide; ethyl sulfide; ethylamine; ethylene; ethylene dichloride; ethylene glycol; ethylene glycol dimethyl ether; ethylene glycol monomethyl ether; ethylene oxide and nitrogen; ethyleneoxide; fluorine; trifluoromethane; fluorotrichloromethane; 2-chloro-2-difluoromethoxy-1,1,1-trifluoroethane; formaldehyde gas; furan; furfuryl alcohol; germanium tetrachloride; germanium tetrahydride; trichlorofluoromethane; chlorotrifluoroethylene; trichlorotrifluoroethane; 1,2-dichloro-1,1,2,2-tetrafluoroethane; hexafluoroethane; dichlorodifluoromethane; chlorotrifluoromethane;1,1,1,2-tetrafluoroethane; bromotrifluoromethane; carbon tetrafluoride; monochlorodifluoromethane; trifluoromethane; octafluorocyclobutane; 1,1,1-trifluoro-2-chloro-2-bromoethane; helium; heptane; hexafluoroethane; hexafluoropropene; hexafluorpropylene; hydriodic acid; hydrogen; hydrogen bromide; hydrogen chloride; hydrogen cyanide; hydrogen fluoride; hydrogen selenide; hydrogen sulfide; hydrogen iodide; iodine pentafluoride; isobutane; isobutene; isobutyl alcohol; isobutyl nitrate; isobutylene; isohexene; isopentane; isoprene; isopropyl alcohol; isopropyl chloride; isopropyl ether; isopropyl mercaptan; krypton; methane; methane in argon, helium and nitrogen or air mixture; methane; methane and hydrogen gas mixture; methanol; methoxyflurane; methyl acetate; methyl acetylene; methyl acrylate; methyl alcohol; methyl bromide; methyl chloride; methyl chloroform; methyl disulfide; methyl ethyl ketone; methyl fluoride; methyl formate; methyl iodide; methyl isobutyl ketone; methyl mercaptan; methyl methacrylate; methyl propionate; methyl salicylate; methyl tert-butyl ether; methyl vinyl ketone; dimethoxymethane; methylamine; methylcyclopentane; methylene bromide; methylene fluoride; monomethylamine; m-xylene; n-amylamine; metal oxides and metal chlorides; metal oxides, metal bromides absorbed hydrogen bromide on compound, and hydrogen bromide vapor; metal oxides, metal chlorides, absorbed hydrogen chloride on compound, and hydrogen chloride vapor; organolithium polymer, lithium amide, and anhydrous ammonia; organolithium, sulfur hexafluoride, and lithium hydride; organolithium polymer and lithium hydride; metal oxides; naphthalene; n-butane; n-butyl acetate; n-butyl alcohol; n-butyl sulfide; n-butyraldehyde; n-decane; neohexane; neon; neopentane; n-heptane; n-hexane; nickel carbonyl; nitric oxide; nitric oxide and nitrogen mixture; nitric oxide and sulfur dioxide and nitrogen gas mixture; nitrogen dioxide; nitrogen trifluoride; nitrosyl chloride; nitrous oxide; n-octane; nonane; n-pentane; n-propyl acetate; n-propyl alcohol; octafluorocyclobutane; octafluorocyclopentene; octane; o-dichlorobenzene; oxides of nitrogen in nitrogen; oxygen in nitrogen; oxygen, compressed gas; oxygen and nitrogen gas mixture; o-xylene; pentane; perfluoro-2-butene; perfluoropropane; permanganate and alkali impregnated diatomaceous earth; phosgene; phosphine; phosphine pentafluoride; phosphorus pentafluoride; phosphorus trifluoride, piperidine; tetraethylene glycol dimethyl ether and sodium naphthalene complex; ethylene glycol dimethyl ether and sodium naphthalene complex; propane; propane in air; propane in nitrogen; propionaldehyde; propyl mercaptan; propylene; propylene oxide; p-xylene; pyridine; arsenic fluoride; arsine; boron trifluoride; germanium tetrafluoride; phosphine; silicon tetrafluoride; sec-butyl alcohol; silane; silicon tetrachloride; silicon tetrafluoride; sodium dichromate; sodium dispersion in mineral spirits; sodium dispersion in naphthalene; sodium dispersion in transformer oil; sodium metal dispersion in organic solvent; sodium metal; sodium methylate; sodium shot; styrene; styrene monomer; sulfur dioxide; sulfur dioxide in air; sulfur dioxide in nitrogen; sulfur dioxide and nitrogen mixture; sulfur hexafluoride; sulfur tetrafluoride; sulfuryl fluoride; tert-butyl chloride; tert-butyl mercaptan; tetrachloroethylene; tetraethylene glycol dimethyl ether; tetraethylorthosilicate; tetrafluoroethylene; tetrafluoromethane; tetrahydrofuran; tetrahydronaplithalene; thiophene; titanium tetrachloride; toluene; trans-1,2-dichloroethylene; trans-2-butene; trans-2-pentene; trans-3-hexene; trans-3-hexene; transition metal salt impregnated diatomaceous earth; trichioroethylene; trichlorsilane; triethyl phosphite; triethylene glycol; trifluorochloroethylene; trifluoromonobromomethane; trimethyl phosphite; trimethylamine; tungsten hexafluoride; undecane; valeraldehyde; vinyl acetate; vinyl bromide; vinyl chloride; vinyl fluoride; vinyl methyl ether; vinylidene chloride; vinylidene fluoride; xenon; zinc arsenide; enriched stable isotopes; stable isotope labeled compounds; and liquefied gases, namely, argon, carbon dioxide, nitrogen oxide, oxygen, and o-dichlorobenzene | ACTIVE | Oct 31, 2004 |
| 004 | Gases used as fuels | ACTIVE | Oct 31, 2004 |
| 005 | Gases for medical use | ACTIVE | Oct 31, 2004 |
| 009 | Instruments, namely, gas chromatographs, process analyzers, laboratory analyzers, gas detectors, safety analyzers, spectyophotometers, spectrometers, detection systems primarily comprised of gas detectors, gas monitors, gas calibration kits comprised of pressure regulators and flowmeters for field calibration of gas detection systems or portable instrumentation, and gas analyzers, regulators and gauges, and controls and parts thereof for the controlled dispensing and measuring of gases in laboratory and industrial use; flow and level instrumentation, namely, flow meters, mass flow transducers, blenders, gas standards generators, flow-totalizers, rotameters, and control valves for measuring and controlling the flow of gases and for the monitoring and control of gases; apparatus for the handling, measuring, and controlled dispensing of compressed gases from cylinders, namely, control valves, pressure regulators for regulating the handling, measuring, and controlled dispensing of compresses gases and cryogenic liquids, flow meters, and gauges; equipment for gas containment and distribution, namely, gas panels, gas cabinets, gas manifolds, switchover systems primarily comprised of more than one gas source, two regulators and a common discharge line, point-of-use distribution panels, pressure regulators, flow valves, monitors, pressure transducers, and pressure monitors; gas detectors and monitors; gas hygrometers; welders, in the nature of electric stick metal arc, tungsten inert gas, metal inert gas, plasma, and submerged arc welders, welding electrodes and wire therefor; protective masks, namely, welding masks, gas masks, and dust masks; protective gloves; and mass flow meters for flow sensing of gases | ACTIVE | Oct 31, 2004 |
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Aug 19, 2026 | ASGN | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP | — |
| Aug 28, 2017 | NA89 | NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED | — |
| Aug 28, 2017 | RNL1 | REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS) | The trademark registration was renewed for another 10-year term after acceptable maintenance filings. RNL1, RNL2, and RNL3 indicate which renewal cycle (first, second, or third 10-year term) was recorded. The registration remains active. |
| Aug 28, 2017 | 89AG | REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED | The USPTO accepted your combined Section 8 declaration and Section 9 renewal application. The registration is renewed for another 10-year term. The next combined maintenance filing will be due at the following 10-year anniversary. |
| Aug 28, 2017 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Jul 18, 2017 | E89R | TEAS SECTION 8 & 9 RECEIVED | — |
| Dec 11, 2016 | REM2 | COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED | — |
| Jul 24, 2013 | NA85 | NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED | — |
| Jul 24, 2013 | C15A | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. | — |
| Jul 15, 2013 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Jul 1, 2013 | E815 | TEAS SECTION 8 & 15 RECEIVED | — |
| Dec 11, 2007 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Nov 6, 2007 | REGV | LAW OFFICE REGISTRATION REVIEW COMPLETED | — |
| Nov 5, 2007 | ALIE | ASSIGNED TO LIE | — |
| Oct 3, 2007 | CNPR | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED | — |
| Sep 29, 2007 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Sep 28, 2007 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Sep 28, 2007 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Sep 6, 2007 | CNRT | NON-FINAL ACTION MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Sep 5, 2007 | CNRT | SU - NON-FINAL ACTION - WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Aug 28, 2007 | SUPC | STATEMENT OF USE PROCESSING COMPLETE | — |
| Aug 3, 2007 | EISU | TEAS STATEMENT OF USE RECEIVED | The applicant filed a Statement of Use with specimens showing the mark in actual commerce. The USPTO will review the filing for compliance. If accepted, the mark can proceed to registration; if deficient, the USPTO may issue a requirement or office action. |
| Aug 2, 2007 | IUAF | USE AMENDMENT FILED | — |
| Jan 10, 2007 | EX1G | SOU EXTENSION 1 GRANTED | — |
| Jan 10, 2007 | EXT1 | SOU EXTENSION 1 FILED | — |
| Jan 10, 2007 | EEXT | SOU TEAS EXTENSION RECEIVED | The applicant requested more time to file a Statement of Use before the Notice of Allowance deadline. Each extension typically adds six months. A limited number of extensions are available for intent-to-use applications not yet in use. |
| Aug 8, 2006 | NOAM | NOA MAILED - SOU REQUIRED FROM APPLICANT | A Notice of Allowance means your intent-to-use application cleared examination and opposition but is not registered yet. You must file a Statement of Use showing the mark in commerce, or request an extension, before the deadline — usually six months from the notice date. |
| May 16, 2006 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Apr 26, 2006 | NPUB | NOTICE OF PUBLICATION | — |
| Mar 27, 2006 | PREV | LAW OFFICE PUBLICATION REVIEW COMPLETED | — |
| Mar 24, 2006 | ALIE | ASSIGNED TO LIE | — |
| Mar 17, 2006 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Mar 16, 2006 | ACEC | AMENDMENT FROM APPLICANT ENTERED | — |
| Mar 2, 2006 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Mar 2, 2006 | PAPER RECEIVED | — | |
| Sep 15, 2005 | GEAP | EXAMINER'S AMENDMENT/PRIORITY ACTION E-MAILED | — |
| Sep 15, 2005 | CPEA | EXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED | — |
| Apr 25, 2005 | GEAP | EXAMINER'S AMENDMENT/PRIORITY ACTION E-MAILED | — |
| Apr 25, 2005 | CPEA | EXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED | — |
| Apr 25, 2005 | DOCK | ASSIGNED TO EXAMINER | — |
| Oct 12, 2004 | NWAP | NEW APPLICATION ENTERED | — |