USPTO serial 79044455
NANOGROWTH
Reviewed by CopyMark Law Group
Reg. 3631493Status 404
- Filing date
- Status date
- Registration date
- Jun 2, 2009
- Examiner
- DAHLING, KRISTIN M
- Law office
- PUBLICATION AND ISSUE SECTION
What this means
This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.
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Owner
Newhaven, East Sussex BN9 ODQ, GB
Newhaven, East Sussex BN9 ODQ, GB
Newhaven, East Sussex BN9 ODQ, GB
Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Machine tools, namely, lathes, centrifuges, and grinders, all for use with plasma enhanced chemical vapor deposition (PECVD) machines, low pressure chemical vapor deposition (CVD) machines, chemical vapor deposition equipment and machines, rapid thermal process machines, rapid thermal anneal (RTA) machines, nano filtration equipment and machines, sputter equipment and machines, e-beam equipment and machines, evaporation machines, e-beam lithography machines, machines for the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon; machines for turning and grinding, namely, sputtering machines and centrifugal grinding machines; machines and machine tools for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires; nanomachines for process filtration in the pharmaceutical industry; plasma process apparatus, namely, plasma etching machines; turnkey equipment and installations, namely, starter alternators; electric motors, namely, electric motors for machines; oil filters; chucks for lathes and power drills; Machine tools, namely, filters, all for use with plasma enhanced chemical vapor deposition (PECVD) machines, low pressure chemical vapor deposition (CVD) machines, chemical vapor deposition machines, rapid thermal process machines, rapid thermal anneal (RTA) machines, nano filtration machines, sputter machines, e-beam machines, evaporation machines, e-beam lithography machines, machines for the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon | SECTION 71 - CANCELLED | — |
| 009 | Computer software for the control of machines used in the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon; computer software systems to enable research into the integration of carbon nanotubes (CNTs) technology into semiconductor devices, silicon nanowire growth for advanced silicon chip technologies, high performance solar cells, fuel cell technologies, and novel flat panel display coatings; computer software for the operation of machine tools, machines for turning and grinding, machines for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires, nanomachines, and plasma process apparatus; educational software featuring instruction in the operation of machine tools, machines for turning and grinding, machines for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires, nanomachines, and plasma process apparatus; computer hardware; software for ensuring processes are running according to specified parameters; software for calculating the required parameters to obtain the desired performance of machines; apparatus and devices for laboratory purposes and for use in the chemical industry and for establishing the properties of materials, namely, spectrometers, visible light spectrometers, infrared spectrometers, Raman spectrometers, x-ray inspection machines, ellipsometers; blank magnetic data carriers; pre-recorded magnetic data carriers featuring software for operation of machines that create structures in which at least one characteristic dimension is smaller than 1 micron; calculating machines, data processing equipment and computers; sputtering apparatus and instruments, namely, sputter devices used in further manufacture of goods by depositing material and substrates using a sputtering process | SECTION 71 - CANCELLED | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by Surrey NanoSystems Limited
- Other trademarks owned by Surrey NanoSystems Limited
- Other trademarks owned by Surrey NanoSystems Limited
- Other trademarks in Class 007
- Other trademarks in Class 009
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Mar 16, 2018 | DENC | NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG MAILED | — |
| Mar 16, 2018 | DETH | DEATH OF INTERNATIONAL REGISTRATION | — |
| Mar 31, 2017 | INNT | TOTAL INVALIDATION PROCESSED BY THE IB | — |
| Sep 8, 2016 | INTS | TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB | — |
| Sep 8, 2016 | INPC | INVALIDATION PROCESSED | — |
| Sep 8, 2016 | INTR | TOTAL INVALIDATION OF REG EXT PROTECTION CREATED | — |
| Jan 8, 2016 | C71T | CANCELLED SECTION 71 | — |
| Jan 12, 2013 | FINO | FINAL DECISION TRANSACTION PROCESSED BY IB | — |
| Sep 9, 2009 | FICS | FINAL DISPOSITION NOTICE SENT TO IB | — |
| Sep 9, 2009 | FIMP | FINAL DISPOSITION PROCESSED | — |
| Sep 2, 2009 | FICR | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | — |
| Jun 2, 2009 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Apr 16, 2009 | OPNX | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB | — |
| Apr 2, 2009 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Apr 2, 2009 | OPNR | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB | — |
| Mar 17, 2009 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Feb 25, 2009 | NPUB | NOTICE OF PUBLICATION | — |
| Feb 10, 2009 | PREV | LAW OFFICE PUBLICATION REVIEW COMPLETED | — |
| Feb 10, 2009 | ALIE | ASSIGNED TO LIE | — |
| Jan 30, 2009 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jan 25, 2009 | XAEC | EXAMINER'S AMENDMENT ENTERED | — |
| Jan 25, 2009 | GNEN | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | — |
| Jan 25, 2009 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| Jan 25, 2009 | CNEA | EXAMINERS AMENDMENT -WRITTEN | — |
| Dec 30, 2008 | EXPI | EX PARTE APPEAL-INSTITUTED | — |
| Dec 30, 2008 | JURT | JURISDICTION RESTORED TO EXAMINING ATTORNEY | — |
| Dec 30, 2008 | EXAF | EXPARTE APPEAL RECEIVED AT TTAB | — |
| Dec 30, 2008 | ERFR | TEAS REQUEST FOR RECONSIDERATION RECEIVED | — |
| Dec 30, 2008 | ERFR | TEAS REQUEST FOR RECONSIDERATION RECEIVED | — |
| Jul 2, 2008 | GNFN | NOTIFICATION OF FINAL REFUSAL EMAILED | — |
| Jul 2, 2008 | GNFR | FINAL REFUSAL E-MAILED | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Jul 2, 2008 | CNFR | FINAL REFUSAL WRITTEN | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Jun 10, 2008 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Jun 10, 2008 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Jun 10, 2008 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Jun 10, 2008 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Dec 29, 2007 | RFNT | REFUSAL PROCESSED BY IB | — |
| Dec 11, 2007 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Dec 11, 2007 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Dec 11, 2007 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Dec 10, 2007 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Dec 7, 2007 | DOCK | ASSIGNED TO EXAMINER | — |
| Nov 2, 2007 | NWAP | NEW APPLICATION ENTERED | — |
| Nov 1, 2007 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |