USPTO serial 79045546
EVG
Reviewed by CopyMark Law Group
Reg. 3612566Status 706Registered
- Filing date
- Status date
- Registration date
- Apr 28, 2009
- Examiner
- FRENCH, CURTIS W
- Law office
- GENERIC WEB UPDATE
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Owner
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Patricia A. Walker
Patricia A. Walker Walker & Jocke Co., LPA231 South BroadwayMEDINA, OH 44256UNITED STATESGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Machines and structural parts therefore, for the production, treatment, transport and processing of electronic components, namely, semiconductors, in the field of microelectronic, medical technology, biotechnology, semiconductor technology and microsystems technology; machines and structural parts therefor, for the production, treatment and processing of semiconductors; machines and structural parts therefore for treatment of surfaces of electronic components, especially wafers | ACTIVE | — |
| 009 | Scientific apparatus and instruments for microelectronics, biotechnology, microsystem techniques, semiconductor and nanotechnology, namely, exposure systems for 1X lithography applications, namely, mask aligners and contact and proximity printers and devices for joining one or multiple substrates temporarily or permanently, namely, substrate bonding systems comprised of UV-radiation/UV-light source devices, heaters, and pneumatic and hydraulic piston setups and spindles; systems for the application of coatings to work pieces, namely, resist coaters, developer systems for developing lithographically structured layers, namely, resist developers, imprinting systems used to imprint pattern onto surfaces on work pieces, namely, imprint lithography systems comprised of one or more of the following components, alignment stages for substrate to stamp alignment suitable for a single step or step and repeat alignment, means to apply imprinting force, means to cure the imprint resist such as a UV- light source and heaters, measurement apparatus that can detect the relative position of the stamp versus the substrate and provide the input for the alignment procedure; lamination equipment used to coat surfaces with tape like materials; surveying instruments; electric, photographic, optical, measuring, signal, and monitoring devices, namely, precision systems in the semiconductor technology, in microelectronics, in medical equipment techniques, biotechnology, microsystem techniques, and nanotechnology, namely, front to backside alignment accuracy measurement systems comprised of one or more of the following: measurement apparatus that detects a reference pattern on both the front and on the backside of a substrate and stages that allow for moving the substrate so that the measurement apparatus can detect the pattern at the desired location of the substrate, as well as computer hardware that can analyze the data and calculate misalignment values between the pattern on the front and on the backside; infrared microscopes, metrology systems comprised of one or more of the following, infrared light source devices for infrared inspection of the bonding interface, infrared detectors to detect the infrared light passing through the bond interface, ultrasonic transducers and detectors, x-ray transducers and detectors, visible light light-sources and cameras, microscope setups, computer hardware and operating software for data analysis for the inspection of wafer bonding interfaces; overlay accuracy measurement systems comprised of optical detection devices, namely, microscopes and lasers to detect the positions of two patterns in reference to each other, computer hardware for data analysis and collection, as well as mapping; critical dimension metrology systems comprised of optical detection devices, namely, microscopes and lasers to detect the two or more features of a specific pattern on the wafer and allow for calculation of the distance between them, as well as a computer hardware for data analysis, collection and mapping; pressure uniformity metrology apparatus; apparatus for analysis, namely, front to backside alignment accuracy measurement system comprised of one or more of the following: measurement apparatus that detects a reference pattern on both the front and on the backside of a substrate and stages that allow for moving the substrate so that the measurement apparatus can detect the pattern at the desired location of the substrate, as well as computer hardware and software that can analyze the data and calculate misalignment values between the pattern on the front and on the backside; [ semiconductor chips, integrated circuits; ] computer operation programs; [ peripheral equipment for computers; ] data processing units, data processors and computer hardware; computer software related to the analysis of lithography results, software for the analysis of wafer bonding results, aligning software; scientific diagnosis devices in bio-chip format, namely, oligonucleotide-arrays, miniaturized immunologic test-arrays, substance libraries, combinatorial substance libraries on chip surfaces for scientific purposes; [ remote controls for electric systems for remote controlled industrial operational processes, namely, laboratory robots; ] electric control panels for manufacturing facilities for microelectronics, medical equipment techniques, biotechnology, microsystem techniques, and nanotechnology; [ filters and masks for photographic and photolithographic equipment; telescopes; telephones; semiconductors; ] monitoring devices, namely, oscillographs, indicators, surveying instruments; [ data processing coupler; special furniture for laboratories; ] laser for non-medical purposes; [ reading devices for processing electronic data; ] measuring instruments and measuring devices, namely, laser measuring devices; material testing instruments and machines, namely, machines for testing bonding strength in bonded substrates, front to backside alignment accuracy measurement systems comprised of one or more of the following: measurement apparatus that detect a reference pattern on both the front and on the backside of a substrate and stages that allow for moving the substrate so that the measurement apparatus can detect the pattern at the desired location of the substrate, as well as computer hardware and related software that can analyze the data and calculate misalignment values between the pattern on the front and on the backside; infrared microscopes, metrology systems comprised of one or more of the following; infrared light source devices for infrared inspection of the bonding interface, infrared detectors to detect the infrared light passing through the bond interface, ultrasonic transducers and detectors, x-ray transducers and detectors, visible light light-sources and cameras, microscope setups, computer hardware and related software for data analysis for the inspection of wafer bonding interfaces; optical apparatus and instruments, namely, microscopes; photographic apparatus and instruments, namely, cameras; [ video projectors; controlled volume pumps; protective clothing, in particular for clean-rooms; silicon wafers; probes for scientific purposes; spectroscopes; photographic range finders ] | ACTIVE | — |
| 010 | Medical diagnosis devices in bio-chip format, namely, oligonucleotide-arrays, miniaturized immunologic test-arrays, substance libraries for medical purposes, combinatorial substance libraries on chip surfaces for medical purposes [ ; medical diagnostic devices, namely, micro-titer plates and nano-titer plates; analyzers for medical purposes, namely, machines used to carry out automatic testing of biological samples; bio-array chips for being used as diagnosis means for bio-chemical applications, namely, for tissue and secretory tests, as well as for indication of physiologic parameters or of genetic information, for screening in the pharmaceutical industry for developing drugs, for process monitoring with biotechnological processes; miniaturized sensors for use in gene analysis and diagnosis; medical devices, namely, accessories for bio-chips for filling and manipulating the same by machine as well as manually, namely, chip-holders, chip reader devices, as well as electronic, fluidal, and mechanic control therefor ] | ACTIVE | — |
| 042 | Engineering services; development of precision systems and devices for the semiconductor technology; development of devices for microsystem techniques, microelectronics, medical techniques, biotechnology and telecommunication for others; consulting in the fields of medical and scientific equipment; research services in the field of microsystem technology and nanotechnology; research services in the field of bio-sensorics and chemical sensorics; technical consulting for third parties concerning handling production plants and process equipment; providing temporary use of non-downloadable software for data processing; designing of computer software for others | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by EV GROUP E. THALLNER GmbH
- Other trademarks owned by EV GROUP E. THALLNER GmbH
- Other trademarks owned by EV GROUP E. THALLNER GmbH
- Other trademarks in Class 007
- Other trademarks in Class 009
- Other trademarks in Class 010
- Other trademarks in Class 042
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Jun 11, 2020 | NREP | NEW REPRESENTATIVE AT IB RECEIVED | — |
| Feb 28, 2020 | INNP | PARTIAL INVALIDATION PROCESSED BY THE IB | — |
| Jan 16, 2020 | INPS | PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB | — |
| Jan 16, 2020 | INPC | INVALIDATION PROCESSED | — |
| Dec 18, 2019 | INPR | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED | — |
| Apr 18, 2019 | NA71 | NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED | — |
| Apr 18, 2019 | 71AG | REGISTERED-SEC.71 ACCEPTED | — |
| Apr 16, 2019 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Mar 28, 2019 | 71AF | REGISTERED-SEC.71 FILED | — |
| Apr 28, 2018 | REM4 | COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED | — |
| Aug 31, 2017 | RNWL | INTERNATIONAL REGISTRATION RENEWED | — |
| May 16, 2014 | NA75 | NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED | — |
| May 16, 2014 | C75A | REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK. | — |
| May 16, 2014 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Apr 29, 2014 | 715F | REGISTERED - SEC. 71 & SEC. 15 FILED | — |
| Apr 29, 2014 | ES75 | TEAS SECTION 71 & 15 RECEIVED | — |
| Jan 12, 2013 | FINO | FINAL DECISION TRANSACTION PROCESSED BY IB | — |
| Aug 7, 2009 | FICS | FINAL DISPOSITION NOTICE SENT TO IB | — |
| Aug 7, 2009 | FIMP | FINAL DISPOSITION PROCESSED | — |
| Jul 28, 2009 | FICR | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | — |
| Jun 11, 2009 | ADCH | CHANGE OF NAME/ADDRESS REC'D FROM IB | — |
| May 7, 2009 | OPNX | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB | — |
| Apr 28, 2009 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Apr 23, 2009 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Apr 23, 2009 | OPNR | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB | — |
| Feb 10, 2009 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Jan 21, 2009 | NPUB | NOTICE OF PUBLICATION | — |
| Jan 6, 2009 | PREV | LAW OFFICE PUBLICATION REVIEW COMPLETED | — |
| Jan 5, 2009 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Dec 16, 2008 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Dec 15, 2008 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Dec 15, 2008 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Jul 30, 2008 | GNRN | NOTIFICATION OF NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jul 30, 2008 | GNRT | NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jul 30, 2008 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jun 26, 2008 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Jun 26, 2008 | ALIE | ASSIGNED TO LIE | — |
| Jun 25, 2008 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Jun 25, 2008 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Apr 29, 2008 | GNRN | NOTIFICATION OF NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Apr 29, 2008 | GNRT | NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Apr 29, 2008 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Mar 29, 2008 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Mar 28, 2008 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Mar 28, 2008 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Mar 28, 2008 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Dec 21, 2007 | RFNT | REFUSAL PROCESSED BY IB | — |
| Dec 4, 2007 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Dec 4, 2007 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Dec 4, 2007 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Dec 3, 2007 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Nov 26, 2007 | DOCK | ASSIGNED TO EXAMINER | — |
| Nov 26, 2007 | NWAP | NEW APPLICATION ENTERED | — |
| Nov 22, 2007 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |