Drawing for EDWARDS

USPTO serial 79057965

EDWARDS

Reviewed by CopyMark Law Group

Reg. 3799630Status 706Registered
Filing date
Status date
Registration date
Jun 8, 2010
Examiner
FENNESSY, EDWARD JOHN
Law office
TMEG LAW OFFICE 101

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Owner

Attorney of record

The USPTO lists this attorney as the applicant's representative for correspondence on this application.

William S. Fultz

William S. Fultz Womble Bond Dickinson (US) LLP555 Fayetteville Street, Suite 1100Raleigh, NC 27601United States

Goods and services

ClassDescriptionStatusFirst use
004Industrial oils, namely, mineral oils, silicone oils, synthetic oils and perfluoropolyether oils; Industrial lubricants; Industrial greases; Industrial greases, namely, greases used as vacuum sealantsACTIVE—
006METAL VACUUM FLANGE AND METAL VACUUM FLANGE FITTINGS; METAL CLAMPS; COMMERCIAL CONTAINERS OF METAL FOR TRANSPORTING SEMICONDUCTOR PROCESSING EQUIPMENTACTIVE—
007Vacuum pumps; oil sealed vacuum pumps; rotary vane pumps; oil sealed rotary pumps; oil sealed piston pumps; vacuum booster pumps; vacuum scroll pumps; dry vacuum pumps; liquid ring vacuum pumps; industrial dry vacuum pumps; vacuum diaphragm pumps; jet pumps; turbo molecular pumps; compound molecular pumps; regenerative pumps; sub-atmospheric vapour pumps; diffusion pumps; chemical pumping systems comprised of valves, vessels, piping, fittings, positive displacement pumps, gauges and controllers; vacuum pumps for vacuum shelf dryers; steam ejector pumps, all of the aforementioned goods for pumping gases and not for the control of liquids; vacuum deposition machines for deposition of films for use in semiconductor and solar panel processesACTIVE—
009Spectrograph apparatus; mass spectrometers; instruments and apparatus for use in testing, control, detection, monitoring and the analysis of materials in scientific and industrial operations, namely, infrared spectrometers, ultraviolet spectrometers, particle size analyzers and electro chemical sensors; pressure gauges for measuring gas pressure below atmospheric pressure and not including pressure gauges for the measurement of liquids; pressure regulators for use in scientific and industrial vacuum apparatus; leak detectors for fluid leaks in sciatic and industrial vacuum systems or apparatus; ionization gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; magnetron gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; vacuum gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; convection gauges for use in scientific and industrial vacuum apparatus and solely in connection with pumping gases and not for the control of liquids; thermocouple gauges for use in scientific and industrial vacuum apparatus and solely in connection with pumping gases and not for the control of liquids; penning gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; ion gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids, magnetron gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; inverted magnetron gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; wide range gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; thermocouple gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; strain gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; electroacoustic transducers; electrical controllers for gauges, capsule dial gauges for use in scientific and industrial vacuum apparatus and systems; gas sensors for measuring the concentration or presence of target gases in a gas stream, moisture sensors; calibration apparatus, instruments and equipment for the calibration of scientific and industrial vacuum apparatus, vacuum instrumentation and vacuum equipment; computer software for monitoring system status and providing data relating to vacuum, exhaust abatement, chemical use and gas use, relating to the manufacture of semiconductors and integrated circuits; computer software for designing and configuring gas, chemical, vacuum and exhaust management systems machinesACTIVE—
011Gas reactors, thermal processors, pyrophoritic conditioners and gas separators al/for the treatment, purification and disposal of solid, liquid and gaseous matter, water purification units, water treatment equipment, namely, machines and equipment for treating water that has been used as part of the manufacture of semiconductors in order to remove any poisonous/noxious substances from the water, gas scrubbers, high frequency, microwave and DC torch plasma gas scrubbers; gas reactors, thermal processors, pyrophoritic conditioners and gas separators and for use in exhaust gas abatement; gas burners for burning exhaust gases; gas igniters for igniting exhaust gases, gas heaters for heating exhaust gases; gas scrubbers for cleaning exhaust gases from the semiconductor industry and related fields, integrated gas pumping and scrubbing apparatus/machines for pumping and scrubbing exhaust gases; gas separators, namely,pressure swing absorption separators for the separation of specific gases from an exhaust stream; gas recovery machines, namely, machines for the recovery of gaseous precursors and noble gases from the semiconductor industry and related fields, wet scrubbers for scrubbing water soluble gases from an exhaust stream and removing particulates from an exhaust stream; water cooled traps, heated traps and filter traps for the collection and/or removal of semiconductor process exhaust products; gas reactors for use in the semiconductor field or related fields, apparatus for controlling the temperature of exhaust gas pipes, namely, liquid-cooled chillers for the promotion and/or prevention of condensation of semiconductor process by-productsACTIVE—
037Repair and maintenance of semiconductor processing equipment, exhaust gas management systems, chemical distribution systems, water treatment systems, heat exchangers, vacuum apparatus and vacuum pumps and parts and fittings therefor, refurbishment of semiconductor processing equipment; consulting and advisory services in the fields of installation and maintenance of apparatus for the provision of gases and gas mixtures, chemicals, vacuum and/or exhaust management in the manufacture of semiconductors and similar devicesACTIVE—
040Custom manufacturing consultancy and advisory services for others, all regarding manufacturing-related modifications to apparatuses that provide gases, gas mixtures, chemicals, and vacuum and exhaust management during the manufacture of semiconductors and semiconductor devicesACTIVE—
041Arranging of educational seminars in the field of vacuum and exhaust management engineering; Training services in the field of design, installation, modification, calibration, operation, application and maintenance of apparatus for the provision of gases and gas mixtures, chemicals, vacuum and/or exhaust management in the manufacture of semiconductors and similar devicesACTIVE—
042Engineering consultancy and advisory services, all in the field of calibration of apparatuses for the provision of gases and gas mixtures, chemicals, vacuum and exhaust management used in the manufacture of semiconductors and similar devices; design consultancy and advisory services, all in the field of apparatuses for the provision of gases and gas mixtures, chemicals, vacuum and exhaust management used in manufacturing semiconductors and similar devicesACTIVE—

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CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.

Prosecution history

DateCodeEventWhat it means
Dec 5, 2023TCCATEAS CHANGE OF CORRESPONDENCE RECEIVED—
Dec 5, 2023EWORTEAS WITHDRAWAL AS DOMESTIC REPRESENTATIVE RECEIVED—
Dec 5, 2023ARAAATTORNEY/DOM.REP.REVOKED AND/OR APPOINTEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Dec 5, 2023REAPTEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED—
Dec 5, 2023CHANAPPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED—
Dec 5, 2023COARTEAS CHANGE OF OWNER ADDRESS RECEIVED—
Mar 4, 2023NREPNEW REPRESENTATIVE AT IB RECEIVED—
Sep 30, 2020NA71NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED—
Sep 30, 202071AGREGISTERED-SEC.71 ACCEPTED—
Sep 24, 2020PARITEAS VOLUNTARY AMENDMENT RECEIVED—
Jul 21, 2020APRECASE ASSIGNED TO POST REGISTRATION PARALEGAL—
May 26, 2020ES71TEAS SECTION 71 RECEIVED—
Jun 8, 2019REM4COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED—
Nov 2, 2017RNWLINTERNATIONAL REGISTRATION RENEWED—
Aug 31, 2017ADCHCHANGE OF NAME/ADDRESS REC'D FROM IB—
Jun 28, 2016NA75NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED—
Jun 28, 2016C75AREGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.—
Jun 6, 2016APRECASE ASSIGNED TO POST REGISTRATION PARALEGAL—
May 12, 2016ES75TEAS SECTION 71 & 15 RECEIVED—
Feb 11, 2013FINOFINAL DECISION TRANSACTION PROCESSED BY IB—
Sep 13, 2010FICSFINAL DISPOSITION NOTICE SENT TO IB—
Sep 13, 2010FIMPFINAL DISPOSITION PROCESSED—
Sep 8, 2010FICRFINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB—
Jun 8, 2010R.PRREGISTERED-PRINCIPAL REGISTERYour trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive.
Mar 23, 2010NPUBOFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED—
Mar 23, 2010PUBOPUBLISHED FOR OPPOSITIONYour mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance.
Mar 12, 2010OPNXNOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB—
Feb 25, 2010OPNSNOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB—
Feb 25, 2010OPNRNOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB—
Feb 16, 2010PREVLAW OFFICE PUBLICATION REVIEW COMPLETED—
Feb 12, 2010CNSAAPPROVED FOR PUB - PRINCIPAL REGISTER—
Jan 19, 2010TEMETEAS/EMAIL CORRESPONDENCE ENTERED—
Jan 19, 2010CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Jan 19, 2010ERFRTEAS REQUEST FOR RECONSIDERATION RECEIVED—
Jan 13, 2010GEA1NOTIFICATION OF ACTION DENYING REQ FOR RECON E-MAILED—
Jan 13, 2010GECDACTION DENYING REQ FOR RECON E-MAILED—
Jan 13, 2010CNCFACTION CONTINUING FINAL - COMPLETED—
Jan 13, 2010GEA1NOTIFICATION OF ACTION DENYING REQ FOR RECON E-MAILED—
Jan 13, 2010GECDACTION DENYING REQ FOR RECON E-MAILED—
Jan 13, 2010CNCFACTION CONTINUING FINAL - COMPLETED—
Nov 27, 2009JURTJURISDICTION RESTORED TO EXAMINING ATTORNEY—
Nov 25, 2009TEMETEAS/EMAIL CORRESPONDENCE ENTERED—
Nov 25, 2009CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Nov 24, 2009ERFRTEAS REQUEST FOR RECONSIDERATION RECEIVED—
Nov 23, 2009ARAAATTORNEY/DOM.REP.REVOKED AND/OR APPOINTEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Nov 23, 2009REAPTEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED—
Nov 20, 2009EXPIEX PARTE APPEAL-INSTITUTED—
Nov 20, 2009EXAFEXPARTE APPEAL RECEIVED AT TTAB—
Nov 12, 2009RECDACTION DENYING REQ FOR RECON MAILED—
Nov 12, 2009CNCFACTION CONTINUING FINAL - COMPLETED—
Oct 23, 2009ACECAMENDMENT FROM APPLICANT ENTERED—
Oct 23, 2009CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Oct 15, 2009MAILPAPER RECEIVED—
Apr 22, 2009CNFRFINAL REFUSAL MAILEDA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Apr 21, 2009CNFRFINAL REFUSAL WRITTENA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Apr 1, 2009ACECAMENDMENT FROM APPLICANT ENTERED—
Apr 1, 2009CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Apr 1, 2009ALIEASSIGNED TO LIE—
Mar 31, 2009MAILPAPER RECEIVED—
Nov 14, 2008NREPNEW REPRESENTATIVE AT IB RECEIVED—
Oct 17, 2008RFNTREFUSAL PROCESSED BY IB—
Oct 1, 2008RFCSNON-FINAL ACTION MAILED - REFUSAL SENT TO IB—
Oct 1, 2008RFRRREFUSAL PROCESSED BY MPU—
Oct 1, 2008RFCRNON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW—
Sep 30, 2008CNRTNON-FINAL ACTION WRITTENA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Sep 26, 2008DOCKASSIGNED TO EXAMINER—
Sep 26, 2008NWAPNEW APPLICATION ENTERED—
Sep 25, 2008REPRSN ASSIGNED FOR SECT 66A APPL FROM IB—

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