USPTO serial 79085631
TERAPURE
Reviewed by CopyMark Law Group
Reg. 4103574Status 404
- Filing date
- Status date
- Registration date
- Feb 28, 2012
- Examiner
- SERVANCE, RENEE L
- Law office
- PUBLICATION AND ISSUE SECTION
What this means
This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.
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Owner
75447 Sternenfels, DE
75447 Sternenfels, DE
75447 Sternenfels, DE
DE
Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Machines for manufacturing semiconductor substrates, hard discs, silicon discs, semiconductor wafers, photo masks, hard masks, embossing masks, quartz templates, metal templates, glass templates used in the manufacture of semiconductors, patterned media, structured masks and substrates for nanoimpring lithography; Machines used for wet chemical treatment of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Fully automatic machines used for cleaning, coating, developing, etching and stripping of substrates in the nature of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Machines for the semiconductor and hard disc industry, namely, machines for varnishing and coating of substrates, namely, machines for varnishing and coating semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Machines for curing coatings and varnishes; machines for cleaning of substrates, in the nature of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Machines used for the manufacture of semiconductors and hard discs; Non-electronic, non-scientific machines for the inspection of substrates and discs; Machines for photo lithographic developing and baking processes for substrates; Machines for etching layers on substrates; Handling and automation components, namely, grippers, transport devices in the nature of 3-link atmospheric robotics, linear axis, storage units; conveyors, loading and unloading machines, linear motions machines for moving objects, pivot motions machines for moving objects; Supply and treatment systems for liquids and gases consisting primarily of stepper motor driven diaphragm pumps, piston pumps, diaphragm pumps, chemical and gas filters, Solenoids and media valves, metering machines | SECTION 71 - CANCELLED | — |
| 037 | Installation of the machinery and apparatus listed in class 7 to enable the proper execution of the dry chemical and wet chemical as well as physical methods to be run on the system; Cleaning of surfaces of masks used for the production of semiconductors and hard disks; Cleaning of surfaces of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography by means of dry chemical and wet chemical as well as physical methods; Maintenance of machinery in class 007 | SECTION 71 - CANCELLED | — |
| 040 | Machining and processing of materials, namely, UV light surface preparation of masks used for the production of semiconductors and hard disks; Machining and processing of materials, namely, UV light surface preparation of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Processing of material in the nature of nanoimprint lithographic printing of substrates | SECTION 71 - CANCELLED | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by HamaTech APE GmbH & Co. KG
- Other trademarks owned by HamaTech APE GmbH & Co. KG
- Other trademarks owned by HamaTech APE GmbH & Co. KG
- Other trademarks owned by SÜSS MicroTec SE
- Other trademarks in Class 007
- Other trademarks in Class 037
- Other trademarks in Class 040
- Similar marks named TERAPURE
- Recently changed USPTO trademarks
- Recently filed trademarks
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| May 22, 2021 | DENC | NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED | — |
| May 22, 2021 | DETH | DEATH OF INTERNATIONAL REGISTRATION | — |
| Nov 29, 2019 | INNT | TOTAL INVALIDATION PROCESSED BY THE IB | — |
| Jun 28, 2019 | INTS | TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB | — |
| Jun 28, 2019 | INPC | INVALIDATION PROCESSED | — |
| Jun 5, 2019 | INTR | TOTAL INVALIDATION OF REG EXT PROTECTION CREATED | — |
| Oct 5, 2018 | C71T | CANCELLED SECTION 71 | — |
| May 18, 2018 | ADCH | CHANGE OF NAME/ADDRESS REC'D FROM IB | — |
| Feb 28, 2017 | REM3 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED | — |
| May 31, 2015 | CHLD | CHANGE OF OWNER RECEIVED FROM IB | — |
| Nov 4, 2012 | FINO | FINAL DECISION TRANSACTION PROCESSED BY IB | — |
| Oct 30, 2012 | OPNX | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB | — |
| Sep 10, 2012 | FICS | FINAL DISPOSITION NOTICE SENT TO IB | — |
| Sep 10, 2012 | FIMP | FINAL DISPOSITION PROCESSED | — |
| Jun 30, 2012 | GPNX | NOTIFICATION PROCESSED BY IB | — |
| May 28, 2012 | FICR | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | — |
| Feb 28, 2012 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Feb 1, 2012 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Feb 1, 2012 | OPNR | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB | — |
| Jan 6, 2012 | ISSR | WITHDRAWN FROM ISSUE - SENIOR ATTORNEY REQUEST | — |
| Dec 13, 2011 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Dec 13, 2011 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Nov 23, 2011 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Nov 23, 2011 | OP2R | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | — |
| Nov 23, 2011 | NONP | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | — |
| Nov 9, 2011 | PREV | LAW OFFICE PUBLICATION REVIEW COMPLETED | — |
| Nov 8, 2011 | ALIE | ASSIGNED TO LIE | — |
| Nov 4, 2011 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Nov 2, 2011 | XAEC | EXAMINER'S AMENDMENT ENTERED | — |
| Nov 2, 2011 | GNEN | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | — |
| Nov 2, 2011 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| Nov 2, 2011 | CNEA | EXAMINERS AMENDMENT -WRITTEN | — |
| Oct 17, 2011 | XAEC | EXAMINER'S AMENDMENT ENTERED | — |
| Oct 17, 2011 | GNEN | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | — |
| Oct 17, 2011 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| Oct 17, 2011 | CNEA | EXAMINERS AMENDMENT -WRITTEN | — |
| Sep 19, 2011 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Sep 19, 2011 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Sep 19, 2011 | ERFR | TEAS REQUEST FOR RECONSIDERATION RECEIVED | — |
| Mar 18, 2011 | GNFN | NOTIFICATION OF FINAL REFUSAL EMAILED | — |
| Mar 18, 2011 | GNFR | FINAL REFUSAL E-MAILED | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Mar 18, 2011 | CNFR | FINAL REFUSAL WRITTEN | A final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon. |
| Feb 25, 2011 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Feb 25, 2011 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Feb 25, 2011 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Feb 23, 2011 | ARAA | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Feb 23, 2011 | REAP | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | — |
| Sep 25, 2010 | RFNT | REFUSAL PROCESSED BY IB | — |
| Sep 1, 2010 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Aug 30, 2010 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Aug 30, 2010 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Aug 29, 2010 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Aug 28, 2010 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Aug 28, 2010 | DOCK | ASSIGNED TO EXAMINER | — |
| Aug 28, 2010 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Aug 26, 2010 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |