USPTO serial 79102249
WONIK IPS
Reviewed by CopyMark Law Group
Reg. 4204098Status 404
- Filing date
- Status date
- Registration date
- Sep 11, 2012
- Examiner
- FINE, STEVEN
- Law office
- GENERIC WEB UPDATE
What this means
This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.
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Owner
Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electroluminescence display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; microelectromechanical systems (MEMS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix organic light emitting diode (AMOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ] | SECTION 71 - CANCELLED | — |
| 037 | Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and AMOLED displays ] | SECTION 71 - CANCELLED | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by WONIK IPS CO., LTD
- Other trademarks owned by WONIK IPS CO., LTD
- Other trademarks owned by WONIK IPS CO., LTD
- Other trademarks owned by WONIK IPS CO., LTD
- Other trademarks in Class 007
- Other trademarks in Class 037
- Similar marks named WONIK IPS
- Recently changed USPTO trademarks
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- Browse all trademark records
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Oct 3, 2021 | DENC | NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED | — |
| Oct 3, 2021 | DETH | DEATH OF INTERNATIONAL REGISTRATION | — |
| Jul 3, 2020 | INNT | TOTAL INVALIDATION PROCESSED BY THE IB | — |
| Jun 4, 2020 | INTS | TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB | — |
| Jun 4, 2020 | INPC | INVALIDATION PROCESSED | — |
| Apr 18, 2020 | INTR | TOTAL INVALIDATION OF REG EXT PROTECTION CREATED | — |
| Aug 20, 2019 | NC71 | NOTICE OF CANCELLATION SEC. 71 E-MAILED | — |
| Aug 18, 2019 | C71T | CANCELLED SECTION 71 | — |
| Apr 16, 2019 | INNA | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE | — |
| Mar 31, 2019 | INPR | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED | — |
| Feb 11, 2019 | PR71 | POST REGISTRATION ACTION MAILED - SEC.71 | — |
| Feb 7, 2019 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Jan 31, 2019 | EROP | TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED | — |
| Jan 31, 2019 | EROP | TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED | — |
| Jul 31, 2018 | PR71 | POST REGISTRATION ACTION MAILED - SEC.71 | — |
| May 8, 2018 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Apr 27, 2018 | ES71 | TEAS SECTION 71 RECEIVED | — |
| Oct 16, 2017 | CORN | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED | — |
| Oct 13, 2017 | CRCV | CORRECTION TRANSACTION RECEIVED FROM IB | — |
| Sep 11, 2017 | REM3 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED | — |
| Jul 21, 2016 | CHLD | CHANGE OF OWNER RECEIVED FROM IB | — |
| Aug 17, 2015 | LIMN | LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED | — |
| Jul 31, 2015 | LIMG | LIMITATION OF GOODS RECEIVED FROM IB | — |
| May 6, 2013 | FINO | FINAL DECISION TRANSACTION PROCESSED BY IB | — |
| Apr 16, 2013 | FICS | FINAL DISPOSITION NOTICE SENT TO IB | — |
| Apr 16, 2013 | FIMP | FINAL DISPOSITION PROCESSED | — |
| Dec 11, 2012 | FICR | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | — |
| Dec 2, 2012 | GPNX | NOTIFICATION PROCESSED BY IB | — |
| Sep 11, 2012 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Jun 26, 2012 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Jun 26, 2012 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Jun 6, 2012 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Jun 6, 2012 | OP2R | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | — |
| Jun 6, 2012 | NONP | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | — |
| May 21, 2012 | PREV | LAW OFFICE PUBLICATION REVIEW COMPLETED | — |
| May 11, 2012 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| May 11, 2012 | XAEC | EXAMINER'S AMENDMENT ENTERED | — |
| May 11, 2012 | GNEN | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | — |
| May 11, 2012 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| May 11, 2012 | CNEA | EXAMINERS AMENDMENT -WRITTEN | — |
| Apr 19, 2012 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Apr 19, 2012 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Apr 6, 2012 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Apr 6, 2012 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Dec 30, 2011 | ADCH | CHANGE OF NAME/ADDRESS REC'D FROM IB | — |
| Oct 30, 2011 | RFNT | REFUSAL PROCESSED BY IB | — |
| Oct 19, 2011 | CHAN | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | — |
| Oct 13, 2011 | ALIE | ASSIGNED TO LIE | — |
| Oct 12, 2011 | FAXX | FAX RECEIVED | — |
| Oct 11, 2011 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Oct 11, 2011 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Oct 10, 2011 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Oct 9, 2011 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Oct 4, 2011 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Sep 30, 2011 | DOCK | ASSIGNED TO EXAMINER | — |
| Sep 30, 2011 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Sep 29, 2011 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |