Drawing for SOITEC

USPTO serial 79204687

SOITEC

Reviewed by CopyMark Law Group

Reg. 5563066Status 739Registered
Filing date
Status date
Registration date
Sep 18, 2018
Examiner
HALMEN, KATHERINE E
Law office
Historical data usage

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Owner

Attorney of record

The USPTO lists this attorney as the applicant's representative for correspondence on this application.

Mari-Elise Paul

Mari-Elise Paul McBrayer PLLC500 W. Jefferson St., Suite 2400Louisville, KY 40202United States

Goods and services

ClassDescriptionStatusFirst use
009Semiconductor substrates for opto-electronics, micro-electronics, and micro-engineering, namely, semiconductor chips, integrated circuits, transistors, capacitors, filters for radiofrequency bandwidth selection, oscillators, electric switches, electric resistors, amplifiers, and electronic memories; semi-conductor wafers; semi-conductors; silicon wafers and semiconductors for integrated circuits and derived activities; semiconductor wafers for [ light-emitting diodes, ] radio frequency (RF) components and for power components; substrates for micro-electronics, opto-electronics, micro-engineering, [ light-emitting diodes, ] micro-systems, [ photovoltaics, ] integrated optical guides, sensors, integrated circuits, radio frequency (RF) and power components, namely, semiconductor chips, integrated circuits, transistors, capacitors, cable connectors, filters for radiofrequency bandwidth selection, oscillators, electric switches, electric resistors, amplifiers, and electronic memoriesACTIVE
040Treatment of materials by means of annealing, thermal annealing, rapid thermal annealing, laser annealing, oxidation, implantation for layer exfoliation, grinding, chemical and physical layer deposition in the nature of electrophoretic coating services, epitaxy, and bonding of material for layer transfer; Treatment of substrates by means of glass substrate polishing, grinding, chemical treatment of surface to remove particles and/or contaminants, laser irradiation, plasma treatment in the nature of applying plasma finishes, amorphization, re-crystallization, etching, chemical etching, plasma etching, carbonization, smoothing by means of plasma, heat treatment, plasma activation to hydrophilize surfaces, and hydrophilization for micro-electronics, opto-electronics, piezoelectric, [ photovoltaics, ] microsystems and radio frequency (RF) components; treatment of semiconductor wafers and semiconductors by means of laser beams, plasma in the nature of applying plasma finishes, annealing, and chemical treatment of surface to remove particles and/or contaminants; polishing of semiconductor wafers, transfer of layer by exfoliation; treatment of silicon wafers and semiconductors by means of laser beams, plasma in the nature of applying plasma finishes, annealing, and chemical treatment of surface to remove particles and/or contaminants; polishing of silicon wafers and semiconductors, transfer of layer by exfoliationACTIVE
042Scientific, technological, technical and industrial research in the field of material science for micro-electronics, opto-electronics, piezo electronics and micro-engineering, [ photovoltaics, ] microsystems and radio frequency (RF) components provided by engineers; testing of materials; laboratory work for others, namely, materials testing and scientific research and development; research and development of new products for others; scientific research and development in the field of wafers and semiconductors for opto-electronic and piezo electronics components, [ photovoltaics, ] radio frequency (RF) components, power components, micro-engineering, and micro-systems; scientific research and development in the field of silicon wafers and semiconductors for integrated circuits and derived activities; scientific research and development in the field of the transfer of micro-electronic circuits or micro-systems on all media; engineering and engineering services in the field of semiconductor wafers and semiconductors for micro-electronic, opto-electronic, piezo-electronic radio frequency (RF), micro-mechanical, [ photovoltaic components, ] memories, power components; engineering and engineering services in the field of silicon wafers and semiconductors for integrated circuits and derived activities and the transfer of micro-electronic or opto-electronic circuits or micro-systems on all types of media; research for the development of new products in the field of semiconductor wafers for the manufacture of electronic devices, for the manufacture of transistors, memories, diodes, photodiodes, [ light-emitting diodes, ] photodiode detectors, radio frequency (RF) components and micro-systems; assistance and technical support, namely, technical advice in the field of development of new products in the field of semiconductor wafers for the manufacture of electronic devices, for the manufacture of transistors, diodes, photodiodes, [ light-emitting diodes, ] photodiode detectors, radio frequency (RF) components and micro-systemsACTIVE

Related trademarks

CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.

Prosecution history

DateCodeEventWhat it means
Jul 2, 2026INNPPARTIAL INVALIDATION PROCESSED BY THE IB
May 28, 2026INPSPARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
May 28, 2026INPCINVALIDATION PROCESSED
Nov 6, 2025INPRPARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Oct 10, 2025NA75NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
Oct 10, 2025C75AREGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
Oct 1, 2025EROPTEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Sep 12, 2025PR75POST REGISTRATION ACTION MAILED - SEC. 71 & 15
Aug 26, 2025EROPTEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Mar 6, 2025PR75POST REGISTRATION ACTION MAILED - SEC. 71 & 15
Feb 24, 2025APRECASE ASSIGNED TO POST REGISTRATION PARALEGAL
Sep 17, 2024ES75TEAS SECTION 71 & 15 RECEIVED
Jan 16, 2024TCCATEAS CHANGE OF CORRESPONDENCE RECEIVED
Jan 16, 2024ARAAATTORNEY/DOM.REP.REVOKED AND/OR APPOINTEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Jan 16, 2024REAPTEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Sep 18, 2023REM3COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
Jan 17, 2019FINOFINAL DECISION TRANSACTION PROCESSED BY IB
Dec 29, 2018FICSFINAL DISPOSITION NOTICE SENT TO IB
Dec 29, 2018FIMPFINAL DISPOSITION PROCESSED
Dec 18, 2018FICRFINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Dec 6, 2018NREPNEW REPRESENTATIVE AT IB RECEIVED
Sep 18, 2018R.PRREGISTERED-PRINCIPAL REGISTERYour trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive.
Jul 6, 2018GPNXNOTIFICATION PROCESSED BY IB
Jul 3, 2018NPUBOFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Jul 3, 2018PUBOPUBLISHED FOR OPPOSITIONYour mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance.
Jun 20, 2018OPNSNOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Jun 20, 2018OP2RNOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Jun 13, 2018NONPNOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
May 29, 2018CNSAAPPROVED FOR PUB - PRINCIPAL REGISTER
May 21, 2018TEMETEAS/EMAIL CORRESPONDENCE ENTERED
May 21, 2018CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
May 18, 2018ALIEASSIGNED TO LIE
May 11, 2018ERFRTEAS REQUEST FOR RECONSIDERATION RECEIVED
May 11, 2018EXPIEX PARTE APPEAL-INSTITUTED
May 11, 2018JURTJURISDICTION RESTORED TO EXAMINING ATTORNEY
May 11, 2018EXAFEXPARTE APPEAL RECEIVED AT TTAB
Feb 6, 2018ATRVATTORNEY REVIEW COMPLETED
Jan 24, 2018CREVCORRECTION FROM IB ENTERED - ATTORNEY REVIEW REQUIRED
Dec 21, 2017ADCHCHANGE OF NAME/ADDRESS REC'D FROM IB
Dec 15, 2017CRCVCORRECTION TRANSACTION RECEIVED FROM IB
Nov 13, 2017GNFNNOTIFICATION OF FINAL REFUSAL EMAILED
Nov 13, 2017GNFRFINAL REFUSAL E-MAILEDA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Nov 13, 2017CNFRFINAL REFUSAL WRITTENA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Oct 26, 2017TEMETEAS/EMAIL CORRESPONDENCE ENTERED
Oct 25, 2017CRFACORRESPONDENCE RECEIVED IN LAW OFFICE
Oct 25, 2017TROATEAS RESPONSE TO OFFICE ACTION RECEIVEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
May 13, 2017RFNTREFUSAL PROCESSED BY IB
Apr 26, 2017RFCSNON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Apr 26, 2017RFRRREFUSAL PROCESSED BY MPU
Apr 25, 2017RFCRNON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Apr 24, 2017CNRTNON-FINAL ACTION WRITTENA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Apr 14, 2017MAFRAPPLICATION FILING RECEIPT MAILED
Apr 10, 2017DOCKASSIGNED TO EXAMINER
Apr 10, 2017NWOSNEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Apr 6, 2017REPRSN ASSIGNED FOR SECT 66A APPL FROM IB

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