USPTO serial 79224246
KCTECH
Reviewed by CopyMark Law Group
Reg. 5619639Status 739Registered
- Filing date
- Status date
- Registration date
- Dec 4, 2018
- Examiner
- TENG, SIMON
- Law office
- Historical data usage
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Owner
Gyeonggi-do, KR
Gyeonggi-do, KR
Gyeonggi-do, KR
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
John J. O'Malley
John J. O'Malley VOLPE KOENIG30 South 17th StreetSuite 1800Philadelphia, PA 19103Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 001 | Auxiliary fluids for use with abrasives in the semiconductor industry; chemical slurries for polishing semiconductors and mechanical electronic substrates; chemical mechanical planarization slurry for semiconductors and mechanical electronic substrates; ceria slurries for abrading semiconductor for industrial purposes; epoxy resins, unprocessed; unprocessed acrylonitrile butadiene styrene resins; unprocessed styrene acrylonitrile resins; unprocessed phenolic resins; unprocessed polyallylate resins; unprocessed polyamide resins; unprocessed polyester resins; unprocessed polymethyl metacrylate resins; plasma, exposed, or etching gasses, namely, silane gas, dichlorosilane gas, disilane gas, nitrogen trifluoride gas, and tungsten hexafluoride gas for processing semiconductors and for semiconductor manufacturing processes | ACTIVE | — |
| 007 | Semiconductor wafer processing machines; wet cleaning machines for manufacture of semiconductors for research and development; semiconductor processing machines; chemical mechanical polishing apparatus for semiconductor wafer; abrasive machine for semiconductor wafer; semiconductor wafer support processing equipment and machines; semiconductor processing equipment for research and development; wet cleaning equipment for manufacture of semiconductors; cleaning machines for semiconductor wafer; deposition equipment in the nature of organic light emitting diode wet stations for manufacture of semiconductors and LCDs, namely, wet stations for use to clean, etch, strip, rinse, and dry semiconductor wafers and LCDs; vacuum pump for manufacture of semiconductors; modified chemical vapor deposition machine for manufacturing semiconductors; power-driven cleaning scrubbers for manufacturing semiconductors; gas cabinet filters and purifier for machines for manufacturing semiconductors, namely, filters and purifiers for removing contaminants from gases used in the semiconductor industry; cleaning equipment for LCD industry and supplies, namely, cleaning machines for LCD parts and components; manufacturing machines for liquid crystal display devices; photoresist coating machines; substrate surface plasma etching and cutting machines; cleaning machines for flat panel display using CO2; gas supply valves being parts of machines | ACTIVE | — |
| 042 | Computer aided design of molds; design of machinery; design of machines and apparatus; design of semiconductors; design of integrated circuit; research on construction technology; quality control for others; design of parts of machines; mechanical drawing services; research relating to mechanical engineering; mechanical research; chemistry consultation services; chemical research and analysis; chemical research; product analysis, namely, product failure analysis services; product testing; product quality testing services relating to product stability | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by KC CO., LTD.
- Other trademarks owned by KC CO., LTD.
- Other trademarks owned by KC CO., LTD.
- Other trademarks in Class 001
- Other trademarks in Class 007
- Other trademarks in Class 042
- Similar marks named KCTECH
- Recently changed USPTO trademarks
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- Browse all trademark records
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Apr 30, 2025 | NA75 | NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED | — |
| Apr 30, 2025 | C75A | REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK. | — |
| Apr 20, 2025 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Dec 3, 2024 | ES75 | TEAS SECTION 71 & 15 RECEIVED | — |
| Dec 4, 2023 | REM3 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED | — |
| Mar 29, 2019 | FINO | FINAL DECISION TRANSACTION PROCESSED BY IB | — |
| Mar 11, 2019 | FICS | FINAL DISPOSITION NOTICE SENT TO IB | — |
| Mar 11, 2019 | FIMP | FINAL DISPOSITION PROCESSED | — |
| Mar 4, 2019 | FICR | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | — |
| Dec 7, 2018 | NREP | NEW REPRESENTATIVE AT IB RECEIVED | — |
| Dec 4, 2018 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Sep 18, 2018 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Sep 18, 2018 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Sep 15, 2018 | GPNX | NOTIFICATION PROCESSED BY IB | — |
| Aug 29, 2018 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Aug 29, 2018 | OP2R | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | — |
| Aug 29, 2018 | NONP | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | — |
| Aug 14, 2018 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Aug 14, 2018 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Aug 14, 2018 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Aug 13, 2018 | ALIE | ASSIGNED TO LIE | — |
| Jul 24, 2018 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Feb 16, 2018 | RFNT | REFUSAL PROCESSED BY IB | — |
| Feb 16, 2018 | ADCH | CHANGE OF NAME/ADDRESS REC'D FROM IB | — |
| Jan 24, 2018 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Jan 24, 2018 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Jan 17, 2018 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Jan 16, 2018 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jan 13, 2018 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Jan 9, 2018 | DOCK | ASSIGNED TO EXAMINER | — |
| Jan 9, 2018 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Jan 4, 2018 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |