Drawing for THE GAS PROFESSIONALS

USPTO serial 79363755

THE GAS PROFESSIONALS

Reviewed by CopyMark Law Group

Reg. 7725997Status 700Registered
Filing date
Status date
Registration date
Mar 18, 2025
Examiner
ATTANG, UDEME U
Law office
FILE REPOSITORY (FRANCONIA)

What this means

Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six. Calendar Section 8 between years five and six, and consider trademark monitoring.

Status 700: Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six.

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Owner

Attorney of record

The USPTO lists this attorney as the applicant's representative for correspondence on this application.

Tomoko Nakajima

Tomoko Nakajima Future IP LLC4315 50th Street NW, Suite 100 #7777Washington, DC 20016United States

Goods and services

ClassDescriptionStatusFirst use
001Industrial chemicals; gases for industrial use, namely, gases, not being fuels, for general industrial use, namely, 1,1,1,2-tetrafluoroethane, 1,1,1-trichloro-2,2,2-trifluoroethane, 1,1,1trichloroethane, 1,1,2,2-tetrachloroethane, 1,1,2-trichloro-1,2,2-trifluoroethane, 1,1,2trichloroethane,1,1- dichloroethylene, 1,1-difluoroethane, 1,2-dichlorotetrafluoroethane, 1,3-butadiene, 1-butene, 1-chloro-2-propanol, 1-chloropropane, 1-hexene, 1-octene, 1-pentene, 2,2,4trimethylpentane, 2,3-dimethylbutane, 2,4-dimethylpentane, 2,5-dimethylthiophene, 2-ethylbutene-1, 2hexene, 2-methylbutyraldehyde, 2-methyl-1-butene, 2-methyl-2-butene, 2-methylbutane, 2methylhexane, 2-methylpentane, 2-methylthiophene, 2-pentene, 2-propanol, 3,3-dimethyl-1-butene, 3methyl 1-butene, 3-methylpentane, 4-methyl-1-pentene, 4-vinylcyclohexene, carbon monoxide, carbon dioxide and nitrogen, ethanol in air, acetaldehyde, acetone, acetonitrile, acetylacetone, acetylene, acrolein, acrylonitrile, compressed liquid air, allene, ammonia, antimony pentafluoride, argon, argon and carbon dioxide mixture, argon and helium mixture, argon and oxygen mixture, arsenic fluoride, arsenic pentafluoride, arsine, methyl benzene, benzoic acid, benzyl-D7 chloride, bis trimethylsilyl acetamide, 2-methoxyethyl adipate, boron trichloride, boron trifluoride, bromine pentafluoride, bromine trifluoride, bromochlorodifluoromethane, bromotrifluoroethylene, butadiene, butyl benzene, butyl mercaptan, butyl nitrate, carbon dioxide, carbon dioxide in argon and helium mixture, carbon disulfide, carbon monoxide, carbon monoxide in air, carbon monoxide in nitrogen, carbon tetrachloride, carbonyl fluoride, carbonyl sulfide, chlorine, chlorine trifluoride, chlorobenzene, chlorodifluoromethane, chloroiodomethane, chloropentafluoroethane, chlorotrifluoromethane, cinnamaldehyde, cis-1,2-dichloroethylene, cis-2-butene, cis-2-pentene, cumene, cyanogen, cyanogen chloride, cyclohexane, cyclohexanone, cyclopentane, cyclopropane, deuterium, diborane, dibromomethane, dibutyl ether, dichlorodifluoromethane, dichloromethane, dichloromonofluoromethane, dichlorosilane, dichlorotetrafluoroethane, diethyl disufide, diethyl telluride, difluorodibromomethane, difluoromonochloroethane, digermane, dimethyl ether, dimethyl sulfate, dimethyl sulfide, dimethyl sulfoxide, dimethylamine, dimethyl zinc, dipropyl ether, disilane, dodecane, 2-chloro-1-difluoromethoxy-l, 1,2-trifluoroethane, ethane, ethanol, ethyl acetate, ethyl acetylene, ethyl acrylate, ethyl alcohol, ethyl benzene, ethyl chloride, ethyl cyclohexane, ethyl ether, ethyl formate, ethyl mercaptan, ethyl methyl sulfide, ethyl sulfide, ethylamine, ethylene, ethylene dichloride, ethylene glycol, ethylene glycol dimethyl ether, ethylene glycol monomethyl ether, ethylene oxide and nitrogen, ethylene oxide, fluorine, trifluoromethane, fluorotrichloromethane, 2-chloro-2difluoromethoxy-1, 1, 1-trifluoroethane, formaldehyde gas, furan, furfuryl alcohol, germanium tetrachloride, germanium tetrahydride, trichlorofluoromethane, chlorotrifluoroethylene, trichlorotrifluoroethane, 1,2-dichloro 1,1,2,2-tetrafluoroethane, hexafluoroethane, dichlorodifluoromethane, chlorotrifluoromethane, 1,1,1, 2-tetrafluoroethane, bromotrifluoromethane, carbon tetrafluoride, monochlorodifluoromethane, trifluoromethane, octafluorocyclobutane, 1,1,1 trifluoro-2-chloro-2-bromoethane, helium, heptane, hexafluoroethane, hexafluoropropene, hexafluorpropylene, hydriodic acid, hydrogen, hydrogen bromide, hydrogen chloride, hydrogen cyanide, hydrogen fluoride, hydrogen selenide, hydrogen sulfide, hydrogen iodide, iodine pentafluoride, isobutane, isobutene, isobutyl alcohol, isobutyl nitrate, isobutylene, isohexene, isopentane, isoprene, isopropyl alcohol, isopropyl chloride, isopropyl ether, isopropyl mercaptan, krypton, methane, methane in argon, helium and nitrogen air mixture, methane, methane and hydrogen gas mixture, methanol, methoxyflurane, methyl acetate, methyl acetylene, methyl acrylate, methyl alcohol, methyl bromide, methyl chloride, methyl disulfide, methyl ethyl ketone, methyl fluoride, methyl formate, methyl iodide, methyl isobutyl ketone, methyl mercaptan, methyl methacrylate, methyl propionate, methyl salicylate, methyl tert-butyl ether, methyl vinyl ketone, dimethoxymethane, methylamine, methylcyclopentane, methylene bromide, methylene fluoride, monomethylamine, m-xylene, n-amylamine, naphthalene, n-butane, n-butyl acetate, n-butyl alcohol, nbutyl sulfide, n-butyraldehyde, n-decane, neohexane, neon, neopentane, n-heptane, n-hexane, nickel carbonyl, nitrogen, nitric oxide, nitric oxide and nitrogen mixture, nitric oxide and sulfur dioxide and nitrogen gas mixture, nitrogen dioxide, nitrogen trifluoride, nitrosyl chloride, nitrous oxide, n-octane, nonane, n-pentane, n-propyl acetate, n-propyl alcohol, octafluorocyclobutanem, octafluorocyclopentene, octane, o-dichlorobenzene, oxides of nitrogen in nitrogen, oxygen in nitrogen, oxygen, oxygen and nitrogen gas mixture, o-xylene, pentane, perfluoro-2-butene, perfluoropropane, permanganate and alkali impregnated diatomaceous earth, phosgene, phosphine, phosphorus pentafluoride, phosphorus trifluoride, piperidine, Propane being propellant gases for aerosols, propane in air being gas propellants for aerosols, propane in nitrogen being nitrogen compounds containing minor amounts of propane, propionaldehyde, propyl mercaptan, propylene, propylene oxide, p-xylene, pyridine, arsenic fluoride, arsine, boron trifluoride, germanium tetrafluoride, silicon tetrafluoride, sec-butyl alcohol, silane, silicon tetrachloride, sodium dichromate, sodium metal, styrene, styrene monomer, sulfur dioxide, sulfur dioxide in air, sulfur dioxide in nitrogen, sulfur dioxide and nitrogen mixture, sulfur hexafluoride, sulfur tetrafluoride, sulfuryl fluoride, tert-butyl chloride, tert-butyl mercaptan, tetrachloroethylene, tetraethylene glycol dimethyl ether, tetraethylorthosilicate, tetrafluoroethylene, tetrafluoromethane, tetrahydrofuran, tetrahydronaphithalene, thiophene, titanium tetrachloride, toluene, trans-l,2-dichloroethylene, trans-2-butene, trans-2-pentene, trans-3-hexene, trans3-hexene, transition metal salt impregnated diatomaceous earth, trichloroethylene, trichlorosilane, triethyl phosphite, triethylene glycol, trifluorochloroethylene, trifluoromonobromomethane, trimethyl phosphite, trimethylamine, tungsten hexafluoride, undecane, valeraldehyde, vinyl acetate, vinyl bromide, vinyl chloride, vinyl fluoride, vinyl methyl ether, vinylidene chloride, vinylidene fluoride, xenon, zinc arsenide; stable isotope labeled chemical compounds for industrial use and research use; biochemical products used for scientific research, namely, cell culture media used in microbiology and tissue cultures; reagents for research purposes; gases for weldingACTIVE—

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CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.

Prosecution history

DateCodeEventWhat it means
Oct 18, 2025FINOFINAL DECISION TRANSACTION PROCESSED BY IB—
Sep 25, 2025FICSFINAL DISPOSITION NOTICE SENT TO IB—
Sep 24, 2025FIMPFINAL DISPOSITION PROCESSED—
Jun 18, 2025FICRFINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB—
Mar 18, 2025NRCCNOTICE OF REGISTRATION CONFIRMATION EMAILED—
Mar 18, 2025R.PRREGISTERED-PRINCIPAL REGISTERYour trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive.
Jan 28, 2025NPUBOFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED—
Jan 28, 2025PUBOPUBLISHED FOR OPPOSITIONYour mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance.
Jan 22, 2025NONPNOTIFICATION OF NOTICE OF PUBLICATION E-MAILED—
Oct 28, 2024CNSAAPPROVED FOR PUB - PRINCIPAL REGISTER—
Oct 3, 2024TEMETEAS/EMAIL CORRESPONDENCE ENTERED—
Oct 3, 2024CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Oct 3, 2024ERFRTEAS REQUEST FOR RECONSIDERATION RECEIVED—
Aug 11, 2024OPNXNOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB—
Jul 22, 2024OPNSNOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB—
Jul 21, 2024OPNRNOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB—
Jun 6, 2024GNFNNOTIFICATION OF FINAL REFUSAL EMAILED—
Jun 6, 2024GNFRFINAL REFUSAL E-MAILEDA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Jun 6, 2024CNFRFINAL REFUSAL WRITTENA final Office Action (final refusal) means the examining attorney is maintaining at least one refusal and your options are narrower. You can file a response addressing the refusal, appeal to the Trademark Trial and Appeal Board, or let the application abandon.
Apr 22, 2024TEMETEAS/EMAIL CORRESPONDENCE ENTERED—
Apr 22, 2024CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Apr 22, 2024TROATEAS RESPONSE TO OFFICE ACTION RECEIVEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Nov 13, 2023RFNTREFUSAL PROCESSED BY IB—
Oct 24, 2023RFCSNON-FINAL ACTION MAILED - REFUSAL SENT TO IB—
Oct 24, 2023RFRRREFUSAL PROCESSED BY MPU—
Oct 12, 2023RFCRNON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW—
Oct 11, 2023CNRTNON-FINAL ACTION WRITTENA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Sep 24, 2023DOCKASSIGNED TO EXAMINER—
Mar 3, 2023MAFRAPPLICATION FILING RECEIPT MAILED—
Feb 27, 2023NWOSNEW APPLICATION OFFICE SUPPLIED DATA ENTERED—
Feb 24, 2023REPRSN ASSIGNED FOR SECT 66A APPL FROM IB—

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