USPTO serial 79382467
NITTA DUPONT
Reviewed by CopyMark Law Group
- Filing date
- Status date
- Registration date
- —
- Examiner
- AYALA, LOURDES
- Law office
- TMEG LAW OFFICE 106
What this means
These status codes mean the trademark application is abandoned and no longer pending. Common reasons include missing an Office Action response (600), filing without a valid basis (602), express abandonment by the applicant (604), or failure to respond to an examiner's inquiry (618). Revival may be possible in limited circumstances. If abandonment was unintentional, consult counsel about a petition to revive. Otherwise file a new application if protection is still needed.
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Owner
Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 001 | Hydrophilic chemical agents for industrial purposes; detergents for industrial use; chemicals; chemically reactive solutions for use with abrasives for semiconductors; chemically reactive solutions for use with abrasives for electronic substrates; auxiliary fluids for use with abrasives | ACTIVE | — |
| 003 | Abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations; pads impregnated with polishing preparations; impregnated cloths for polishing; grinding preparations; sharpening preparations; abrasives; scouring solutions; metal polishes; hydrophilic agents for industrial polishing; chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates | ACTIVE | — |
| 007 | Work holding instruments for semiconductor wafer polishing machines and apparatus; templates for semiconductor wafer polishing machines and apparatus; blank templates for semiconductor wafer polishing machines and apparatus; mounting pads and sheets for semiconductor wafer polishing machines and apparatus; polishing pads for semiconductor wafer polishing machines and apparatus; conditioner discs used with polishing pads for semiconductor wafer polishing machines and apparatus; semiconductor wafer polishing machines and apparatus; parts and accessories of semiconductor wafer polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting pads and sheets for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioner discs used with polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting pads and sheets for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioner discs used with polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting pads and sheets for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioner discs used with polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting pads and sheets for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioner discs used with polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus; polishing pads for electric polishing machines; polishing cloths used as parts or accessories of electric polishing machines | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Apr 19, 2025 | OPNX | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB | — |
| Mar 31, 2025 | OPNS | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | — |
| Mar 31, 2025 | OPNR | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB | — |
| Oct 24, 2024 | MAB2 | ABANDONMENT NOTICE MAILED - FAILURE TO RESPOND | The trademark application was abandoned because a required response or document was not filed by the deadline — usually a missed Office Action response. The application is dead unless a petition to revive is granted within a limited time. |
| Oct 24, 2024 | ABN2 | ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSE | The trademark application was abandoned because a required response or document was not filed by the deadline — usually a missed Office Action response. The application is dead unless a petition to revive is granted within a limited time. |
| Apr 24, 2024 | RFNT | REFUSAL PROCESSED BY IB | — |
| Apr 4, 2024 | RFCS | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | — |
| Apr 3, 2024 | RFRR | REFUSAL PROCESSED BY MPU | — |
| Apr 2, 2024 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Apr 1, 2024 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Mar 19, 2024 | RFWR | NON-FINAL ACTION (IB REFUSAL) WITHDRAWN FOR REVIEW | — |
| Feb 27, 2024 | RFCR | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | — |
| Feb 26, 2024 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Feb 14, 2024 | DOCK | ASSIGNED TO EXAMINER | — |
| Nov 11, 2023 | MAFR | APPLICATION FILING RECEIPT MAILED | — |
| Nov 7, 2023 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Nov 6, 2023 | LIMI | LIMITATION FROM ORIGINAL APPLICATION ENTERED | — |
| Nov 2, 2023 | REPR | SN ASSIGNED FOR SECT 66A APPL FROM IB | — |