USPTO serial 87726187
G
Reviewed by CopyMark Law Group
- Filing date
- Status date
- Registration date
- Nov 5, 2019
- Examiner
- ROSSMAN, WILLIAM M
- Law office
- Historical data usage
What this means
Status 702 means the registration is active, Section 8 was accepted, and a Section 15 declaration of incontestability was also accepted. Incontestability strengthens your rights by limiting certain challenges after five years of continuous use. Continue use in commerce and plan for the 10-year Section 8 and 9 renewal.
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Owner
GENES TECH GROUP HOLDINGS COMPANY LIMITED
MONGKOK, HONG KONG, CN
Other trademarks owned by GENES TECH GROUP HOLDINGS COMPANY LIMITED
GENES TECH GROUP HOLDINGS COMPANY LIMITED
MONGKOK, HONG KONG, CN
Other trademarks owned by GENES TECH GROUP HOLDINGS COMPANY LIMITED
GENES TECH GROUP HOLDINGS COMPANY LIMITED
MONGKOK, HONG KONG, CN
Other trademarks owned by GENES TECH GROUP HOLDINGS COMPANY LIMITED
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
Joe McKinney Muncy
Joe McKinney Muncy MUNCY, GEISSLER, OLDS & LOWE, P.C.125 S. Royal StreetAlexandria, VA 22314United StatesGoods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Robotic arms for industrial purposes; Loading and unloading machines; Lifting installations for the transport of persons and goods; Semiconductor wafer processing equipment and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, supporting frames therefor, and parts thereof; Industrial machinery, namely, electromechanical marking machines; Vacuum pumps; Mechanical seals being machine parts; Axles for machines; Transmission shafts, other than for land vehicles; Industrial robots; Pumps for machines; Pumps as parts of machines, motors and engines; Heat exchangers being parts of machines; Power transmission belts for machines; Industrial chemical reactors; Plasma etching machines; Machine parts, namely, hoods; Ejectors as parts of machines; Chemical-mechanical polishing and cleaning machines; Dry semiconductor processing equipment, namely, plasma etching machines, semiconductor wafer processing equipment, single-wafer etching machines; Semiconductor processing equipment, namely, substrate baking, coating, cleaning, developing and drying machines; Chemical machines, namely, semiconductor wafer drying machines, semiconductor wafer scrubbing and washing machines; Semiconductor wafer processing machines; Etching machines used for manufacturing semiconductor wafers; Cleaning machines used for manufacturing semiconductor wafers; Semiconductor wafer cleaning and etching equipment; Semiconductor wet processing equipment; Chemical delivery equipment for semiconductor circuits and wafer processing; Machines for wet-chemical processes, in particular machines for the transportation and for wet chemical etching, cleaning, drying, surface coating, and plating processes, namely, for use in electroplating and electroless plating of semiconductor wafers, semiconductor chips, medical implants, photovoltaic wafers and photovoltaic cells; Machines, namely, installations for wet-chemical etching, wet-chemical cleaning, drying and plating, namely, electro and electroless depositions processing of different substrates, particularly semiconductor wafers, semi-conductor chips, medical implants, photovoltaic wafers, photovoltaic cells; automated transportation and measuring machines for wet-chemical processes; Component parts of machines, namely, feeders in the nature of loading and unloading machines, chucks for use in the manufacturing of semiconductor devices, molds for use in the manufacturing of semiconductor devices; Handling apparatus for loading and unloading, namely, loading and unloading machines; and Holding devices for use in the manufacturing of semiconductor devices; Machines for making computer chips and semiconductors for the chip and semiconductor industries; Semiconductor manufacturing equipment, namely, a substrate masking apparatus preferably for use with an ion implanter; Semiconductor processing and manufacturing equipment having coating, developing, and thermal treatment capabilities used for the processing and production of semiconductor substrates, thin films, photo-resist materials, silicon discs and wafers; Semiconductor manufacturing machines; Semiconductor wafer processing equipment; Semiconductor wafer processing machines; Physical vapor deposition machines and complete ion implantation machines comprised of ion sources, ion accelerators and scanners, processing chambers, vacuum systems, power supplies and controls, ion sources; Machines, machine tools and equipment, namely, semi-automatic, manual and automatic assembly machines; Machines for treatment of electronic components; Wafer frame cleaning machine; Semiconductor processing machines; Semiconductor cleaning machines; Semiconductor diagnostics, support and maintenance machines, and replacement parts for use therewith; Semiconductor substrates manufacturing machines; Semiconductor substrates processing machines; Semiconductor substrates cleaning machines; Semiconductor wafer manufacturing machines; Integrated circuit manufacturing machines; Integrated circuits processing machines; Integrated circuit cleaning machines, integrated circuit polishing machines, integrated circuit diagnostics, support and maintenance machines, and replacement parts for use therewith; Machines and precise mechanical apparatus for the production and processing of electronic, micro mechanic and optical components; Coating machines for the production and processing of electronic, micro mechanic and optical components, in particular spin coater and spray coater; Bonding devices for the production and processing of electronic, micro mechanic and optical components, namely, bonder, used for processing the connection between chip and lead frame; mask alignment apparatus for the production and processing of electronic, micro mechanic and optical components, namely, mask aligner; Apparatus for cleaning semiconductor wafers, masks, flat panels, display and other substrates, namely, scrubber and clean track scrubber; Semiconductor wafer cleaning devices for use in semiconductor wafer cleaning and etching equipment, namely, wet bench; Semiconductor wafer cleaning devices for use in chemical mechanical polishing machines for cleaning semiconductor wafers, namely, in the nature of a CMP chemical mechanical polishing sponge | ACTIVE | Mar 26, 2019 |
| 011 | Furnace used in Semiconductor Processing Equipment; Furnaces, other than for laboratory use; Furnaces | ACTIVE | Mar 26, 2019 |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by GENES TECH GROUP HOLDINGS COMPANY LIMITED
- Other trademarks owned by GENES TECH GROUP HOLDINGS COMPANY LIMITED
- Other trademarks owned by GENES TECH GROUP HOLDINGS COMPANY LIMITED
- Other trademarks in Class 007
- Other trademarks in Class 011
- Similar marks named G
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Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Sep 2, 2025 | NA85 | NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED | — |
| Sep 2, 2025 | C15A | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. | — |
| Sep 2, 2025 | APRE | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | — |
| Apr 25, 2025 | E815 | TEAS SECTION 8 & 15 RECEIVED | — |
| Nov 5, 2024 | REM1 | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED | — |
| Dec 28, 2022 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Dec 28, 2022 | ECDR | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | — |
| Dec 28, 2022 | ARAA | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Dec 28, 2022 | REAP | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | — |
| Dec 23, 2022 | TCCA | TEAS CHANGE OF CORRESPONDENCE RECEIVED | — |
| Dec 23, 2022 | ECDR | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | — |
| Dec 23, 2022 | ARAA | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Dec 23, 2022 | REAP | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | — |
| Nov 5, 2019 | R.PR | REGISTERED-PRINCIPAL REGISTER | Your trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive. |
| Oct 1, 2019 | SUNA | NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED | — |
| Sep 28, 2019 | CNPR | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED | — |
| Sep 11, 2019 | SUPC | STATEMENT OF USE PROCESSING COMPLETE | — |
| Sep 11, 2019 | AITU | CASE ASSIGNED TO INTENT TO USE PARALEGAL | — |
| Aug 13, 2019 | IUAF | USE AMENDMENT FILED | — |
| Aug 13, 2019 | EISU | TEAS STATEMENT OF USE RECEIVED | The applicant filed a Statement of Use with specimens showing the mark in actual commerce. The USPTO will review the filing for compliance. If accepted, the mark can proceed to registration; if deficient, the USPTO may issue a requirement or office action. |
| Feb 19, 2019 | NOAM | NOA E-MAILED - SOU REQUIRED FROM APPLICANT | A Notice of Allowance means your intent-to-use application cleared examination and opposition but is not registered yet. You must file a Statement of Use showing the mark in commerce, or request an extension, before the deadline — usually six months from the notice date. |
| Dec 25, 2018 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Dec 25, 2018 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Dec 5, 2018 | NONP | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | — |
| Nov 12, 2018 | ALIE | ASSIGNED TO LIE | — |
| Oct 30, 2018 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Oct 4, 2018 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Oct 4, 2018 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Oct 4, 2018 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Apr 5, 2018 | GNRN | NOTIFICATION OF NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Apr 5, 2018 | GNRT | NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Apr 5, 2018 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Mar 29, 2018 | DOCK | ASSIGNED TO EXAMINER | — |
| Jan 5, 2018 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| Dec 22, 2017 | NWAP | NEW APPLICATION ENTERED | — |