Drawing for CMC MATERIALS

USPTO serial 88698404

CMC MATERIALS

Reviewed by CopyMark Law Group

Reg. 6667318Status 700Registered
Filing date
Status date
Registration date
Mar 8, 2022
Examiner
CLARK, ROBERT C
Law office
PUBLICATION AND ISSUE SECTION

What this means

Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six. Calendar Section 8 between years five and six, and consider trademark monitoring.

Status 700: Status 700 means the trademark is registered and active on the Principal Register. You have nationwide rights for the listed goods and services and may use ®. Section 8 maintenance is due between years five and six.

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Owner

Attorney of record

The USPTO lists this attorney as the applicant's representative for correspondence on this application.

Cynthia Johnson Walden

Cynthia Johnson Walden Fish & Richardson P.C.PO Box 1022Minneapolis, MN 55440-1022UNITED STATES

Goods and services

ClassDescriptionStatusFirst use
001Chemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth, or otherwise modify their chemical-mechanical properties; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth or otherwise modify their mechanical, physical, chemical and electrical properties; Chemical solutions for use in the manufacturing and processing of semiconductors, namely, photoresist stripper, benzotriazole (BTA) and L-proline solution; Fumed silica dispensed in water used to polish semiconductors; Aqueous metal oxide dispersions for use in semiconductor polishing; Chemical additives, namely, abrasive dispersions for use in the manufacture of electronic components and substrates, optical components, metals, machinery, computer parts, and magnetic data-storage disks and heads; Chemical slurries for use in the manufacture of advanced integrated circuit devices within the semi-conductor industry; High purity chemical compositions for electronic component manufacture; Chemical compositions for use in semiconductor manufacturing, solar cell panel manufacturing and flat panel display manufacturing; Chemical compositions for removal of photoresist and post-etch residues in the manufacture of semiconductors, integrated circuits and related products; Chemicals for use in industry and science; Chemical preparations for use in industry and science, namely, for use in the semiconductor and micro-electronics industries; Chemicals, namely, polymer-containing drag reducers and flow improvers to increase flow of hydrocarbons through pipelines; Chemical mechanical polishing (cmp) slurry and chemical mechanical planarization (cmp) slurry for use in the manufacturing and processing of semiconductors in the optoelectronics and photonics industriesACTIVEMay 24, 2021
003Industrial abrasives, namely, abrasive compounds for lapping and polishing semiconductors, silicon wafers, glass and metal surfaces; Chemical cleaner directed to the electronics industry; Post-copper chemical mechanical planarization (cmp) cleaning solution for use in the manufacturing and processing of semiconductors; Chemical cleaning solution for processing of integrated circuit (ic) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors; Abrasive preparations, namely, chemical cleaners, namely, abrasive dispersion slurries and cleaning and polishing preparations for use in the finishing of electronic components and substrates, optical components, glass, metals, plastics, machinery, computer parts, magnetic data-storage disks and headsACTIVEJan 17, 2021
004Industrial lubricants, namely, valve lubricants for the oil and gas storage, pipeline and gas distribution markets; Industrial lubricants and greasesACTIVEMar 19, 2021
007Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for use in the manufacture of advanced integrated circuit devices within the semiconductor industryACTIVEMay 19, 2021

Related trademarks

CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.

Prosecution history

DateCodeEventWhat it means
Oct 18, 2023ASGNAUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP—
Aug 9, 2023TCCATEAS CHANGE OF CORRESPONDENCE RECEIVED—
Aug 9, 2023ARAAATTORNEY/DOM.REP.REVOKED AND/OR APPOINTEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Aug 9, 2023REAPTEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED—
Aug 9, 2023CHANAPPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED—
Aug 9, 2023COARTEAS CHANGE OF OWNER ADDRESS RECEIVED—
Mar 8, 2022R.PRREGISTERED-PRINCIPAL REGISTERYour trademark is registered on the Principal Register — the strongest form of federal trademark protection. You may use the ® symbol for the covered goods and services. Maintenance filings (Section 8 and renewals) are required to keep the registration alive.
Feb 2, 2022SUNANOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED—
Feb 1, 2022CNPRALLOWED PRINCIPAL REGISTER - SOU ACCEPTED—
Feb 1, 2022EXRANOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED—
Jan 31, 2022SUPCSTATEMENT OF USE PROCESSING COMPLETE—
Jan 31, 2022EX3GSOU EXTENSION 3 GRANTED—
Jan 31, 2022AITUCASE ASSIGNED TO INTENT TO USE PARALEGAL—
Jan 21, 2022IUAFUSE AMENDMENT FILED—
Jan 21, 2022EXT3SOU EXTENSION 3 FILED—
Jan 21, 2022EEXTSOU TEAS EXTENSION RECEIVEDThe applicant requested more time to file a Statement of Use before the Notice of Allowance deadline. Each extension typically adds six months. A limited number of extensions are available for intent-to-use applications not yet in use.
Jan 21, 2022EISUTEAS STATEMENT OF USE RECEIVEDThe applicant filed a Statement of Use with specimens showing the mark in actual commerce. The USPTO will review the filing for compliance. If accepted, the mark can proceed to registration; if deficient, the USPTO may issue a requirement or office action.
Jul 23, 2021EXRANOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED—
Jul 21, 2021EX2GSOU EXTENSION 2 GRANTED—
Jul 21, 2021EXT2SOU EXTENSION 2 FILED—
Jul 21, 2021EEXTSOU TEAS EXTENSION RECEIVEDThe applicant requested more time to file a Statement of Use before the Notice of Allowance deadline. Each extension typically adds six months. A limited number of extensions are available for intent-to-use applications not yet in use.
May 12, 2021ASGNAUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP—
Apr 13, 2021PCGRPETITION TO DIRECTOR GRANTED—
Apr 13, 2021APETASSIGNED TO PETITION STAFF—
Apr 13, 2021APETASSIGNED TO PETITION STAFF—
Jan 14, 2021EXRANOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED—
Jan 12, 2021EX1GSOU EXTENSION 1 GRANTED—
Jan 12, 2021EXT1SOU EXTENSION 1 FILED—
Jan 12, 2021EEXTSOU TEAS EXTENSION RECEIVEDThe applicant requested more time to file a Statement of Use before the Notice of Allowance deadline. Each extension typically adds six months. A limited number of extensions are available for intent-to-use applications not yet in use.
Jan 12, 2021TPDRTEAS PETITION TO DIRECTOR RECEIVED—
Jul 21, 2020NOAMNOA E-MAILED - SOU REQUIRED FROM APPLICANTA Notice of Allowance means your intent-to-use application cleared examination and opposition but is not registered yet. You must file a Statement of Use showing the mark in commerce, or request an extension, before the deadline — usually six months from the notice date.
May 26, 2020NPUBOFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED—
May 26, 2020PUBOPUBLISHED FOR OPPOSITIONYour mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance.
May 6, 2020NONPNOTIFICATION OF NOTICE OF PUBLICATION E-MAILED—
Apr 22, 2020ALIEASSIGNED TO LIE—
Apr 14, 2020CNSAAPPROVED FOR PUB - PRINCIPAL REGISTER—
Apr 13, 2020TEMETEAS/EMAIL CORRESPONDENCE ENTERED—
Apr 13, 2020CRFACORRESPONDENCE RECEIVED IN LAW OFFICE—
Apr 13, 2020TROATEAS RESPONSE TO OFFICE ACTION RECEIVEDThis event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action.
Feb 25, 2020GNRNNOTIFICATION OF NON-FINAL ACTION E-MAILEDA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Feb 25, 2020GNRTNON-FINAL ACTION E-MAILEDA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Feb 25, 2020CNRTNON-FINAL ACTION WRITTENA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Feb 24, 2020GNRNNOTIFICATION OF NON-FINAL ACTION E-MAILEDA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Feb 24, 2020GNRTNON-FINAL ACTION E-MAILEDA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Feb 24, 2020CNRTNON-FINAL ACTION WRITTENA non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application.
Feb 24, 2020DOCKASSIGNED TO EXAMINER—
Nov 26, 2019NWOSNEW APPLICATION OFFICE SUPPLIED DATA ENTERED—
Nov 22, 2019NWAPNEW APPLICATION ENTERED—

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