USPTO serial 97911161
QXP
Reviewed by CopyMark Law Group
Status 774
- Filing date
- Status date
- Registration date
- —
- Examiner
- SCHLEGELMILCH, JONATHON A
- Law office
- PUBLICATION AND ISSUE SECTION
What this means
This page summarizes the public USPTO record for this serial number, including owners, goods and services, and prosecution history.
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Owner
San Jose, CA, US
San Jose, CA, US
Attorney of record
The USPTO lists this attorney as the applicant's representative for correspondence on this application.
YEONG-SAE KIM
1700 WYATT DR.UNIT 9SANTA CLARA, CA 95054Goods and services
| Class | Description | Status | First use |
|---|---|---|---|
| 007 | Machines for semiconductor processing / manufacturing; Machines for thin film deposition; Semiconductor chip manufacturing equipment, namely, semiconductor chip manufacturing machines; Semiconductor wafer processing equipment; Semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; Machines for the production of semiconductors; Robots, vacuum systems, motors and engines, drive units, and parts of machines for operating semiconductor manufacturing machines; Injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; Metal organic vapor deposition equipment, namely, vapor deposition apparatus for semiconductor processing machines, and chemical vapor deposition apparatus for use in manufacturing semiconductors | ACTIVE | — |
| 009 | Recorded computers software for semiconductor processing or for thin film deposition; Semiconductor testing apparatus; Downloadable computer software for use in processing semiconductor wafers; Electronic semiconductor control, checking and measuring devices, namely, computer hardware and recorded computer software for use in measuring, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; Semiconductors; Downloadable computer control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; Downloadable computer operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; Electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces | ACTIVE | — |
| 011 | Industrial apparatus using air to assist in the drying and cleaning of components in the semiconductor industry | ACTIVE | — |
| 040 | Processing of semiconductors or deposition of thin films on substrates; Consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces | ACTIVE | — |
| 042 | Scientific, technological, and industrial research and development services for semiconductor processing or deposition of thin films on substrates; Scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for CVD, PECVD, ALD and AVD of thin films onto surfaces; Industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films | ACTIVE | — |
Related trademarks
CopyMark links this record to cited §2(d) serials, the owner's other marks, Nice classes, similar mark names, and recently changed USPTO applications.
- Other trademarks owned by Eugenus, Inc.
- Other trademarks owned by Eugenus, Inc.
- Other trademarks in Class 007
- Other trademarks in Class 009
- Other trademarks in Class 011
- Other trademarks in Class 040
- Other trademarks in Class 042
- Similar marks named QXP
- Recently changed USPTO trademarks
- Recently filed trademarks
- Browse all trademark records
Prosecution history
| Date | Code | Event | What it means |
|---|---|---|---|
| Sep 7, 2024 | ETOP | EXTENSION OF TIME TO OPPOSE PROCESS - TERMINATED | — |
| Sep 6, 2024 | OP.I | OPPOSITION INSTITUTED NO. 999999 | — |
| Aug 6, 2024 | ETOF | EXTENSION OF TIME TO OPPOSE RECEIVED | — |
| Jul 9, 2024 | NPUB | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | — |
| Jul 9, 2024 | PUBO | PUBLISHED FOR OPPOSITION | Your mark was published in the USPTO Official Gazette for a 30-day opposition window. During that period, third parties who believe they would be harmed can file an opposition. If no opposition is filed, prosecution usually continues toward registration or a Notice of Allowance. |
| Jun 19, 2024 | NONP | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | — |
| Jun 5, 2024 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Jun 5, 2024 | XAEC | EXAMINER'S AMENDMENT ENTERED | — |
| Jun 5, 2024 | GNEN | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | — |
| Jun 5, 2024 | GNEA | EXAMINERS AMENDMENT E-MAILED | — |
| Jun 5, 2024 | CNEA | EXAMINERS AMENDMENT -WRITTEN | — |
| May 17, 2024 | GNRN | NOTIFICATION OF NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| May 17, 2024 | GNRT | NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| May 17, 2024 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| May 10, 2024 | ZZZX | PREVIOUS ALLOWANCE COUNT WITHDRAWN | — |
| Mar 26, 2024 | PBCR | WITHDRAWN FROM PUB - OG REVIEW QUERY | — |
| Mar 11, 2024 | CNSA | APPROVED FOR PUB - PRINCIPAL REGISTER | — |
| Mar 8, 2024 | TEME | TEAS/EMAIL CORRESPONDENCE ENTERED | — |
| Mar 8, 2024 | CRFA | CORRESPONDENCE RECEIVED IN LAW OFFICE | — |
| Mar 8, 2024 | TROA | TEAS RESPONSE TO OFFICE ACTION RECEIVED | This event means the applicant filed a response to a USPTO Office Action — typically arguments, amendments, or evidence addressing the examiner's objections. The USPTO will review the response and either allow the mark to proceed or issue another action. |
| Jan 19, 2024 | GNRN | NOTIFICATION OF NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jan 19, 2024 | GNRT | NON-FINAL ACTION E-MAILED | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Jan 19, 2024 | CNRT | NON-FINAL ACTION WRITTEN | A non-final Office Action means the USPTO examining attorney has raised at least one issue with your trademark application but has not made a final decision. You usually have three months to respond with arguments, amendments, or evidence. Missing the deadline can abandon the application. |
| Nov 30, 2023 | DOCK | ASSIGNED TO EXAMINER | — |
| May 25, 2023 | NWOS | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | — |
| May 1, 2023 | NWAP | NEW APPLICATION ENTERED | — |